| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 310800ST001 | Ga2O3 | 99.99% | Ø 25.4 mm x 3.175 mm | 1 | POR | Inquire |
| 310800ST002 | Ga2O3 | 99.99% | Ø 50.8 mm x 6.35 mm | 1 | POR | Inquire |
| 310800ST003 | Ga2O3 | 99.99% | Ø 76.2 mm x 6.35 mm | 1 | POR | Inquire |
| 310800ST004 | Ga2O3 | 99.99% | Ø 101.6 mm x 3.175 mm | 1 | POR | Inquire |
| 310800ST005 | Ga2O3 | 99.99% | Ø 152.4 mm x 6.35 mm | 1 | POR | Inquire |
Gallium Oxide sputtering targets are materials with good electrical conductivity, high density, and good thermal stability. They are prepared by powder metallurgy method, vacuum melting method, etc., and are used for sputtering coating in semiconductors, optics, flat panel displays, and solar cells.
Chemical formula: Ga₂O₃.
Appearance: White or off-white.
Good electrical conductivity: It can effectively transfer the electric charge during the sputtering process to ensure the uniformity and stability of the sputtering coating.
High purity: the purity is generally above 99.9%, high purity gallium oxide target can reduce the impact of impurities on the coating performance and improve the quality of the film.
High density: high density, which makes the target in the sputtering process can withstand high energy bombardment, not easy to rupture or damage, but also conducive to improving the sputtering efficiency and film deposition rate.
Good thermal stability: In the sputtering process will produce high heat, gallium oxide sputtering targets need to have good thermal stability to ensure that no deformation, melting or decomposition occurs at high temperatures.
Semiconductor field: Used in the preparation of insulating layers, passivation layers, gate insulating layers, etc. for semiconductor devices. For example, in power semiconductor devices, gallium oxide sputtering targets can be used to prepare insulating layers with high dielectric constants to improve device performance and reliability.
Optical field: It can be used to prepare optical films, such as transmittance enhancement film, reflective film, light filtering film and so on. Gallium oxide film has high refractive index and good optical properties, which can meet the requirements of optical devices on thin film materials.
Flat panel display field: in the liquid crystal display (LCD), organic light-emitting diodes (OLED) and other flat panel display devices, gallium oxide sputtering target can be used to prepare transparent conductive film, electrode materials.
Solar cell field: used in the preparation of solar cell electrodes, window layer, etc., to help improve the photoelectric conversion efficiency of solar cells.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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