Gadolinium Oxide

Gadolinium Oxide sputtering target is a gadolinium oxide-based sputtering material that is solid, of high purity and density, and is used in processes such as physical vapour deposition to deposit thin films of gadolinium oxide on a substrate material, which plays a key role in the fields of optics, electronics, magnetism and medicine.

Properties

Appearance and form: Gadolinium Oxide is usually a white, solid target with certain shapes and sizes, which can be processed into round, square or other shapes according to specific needs.

High melting point: The melting point is about 2330°C, which enables it to withstand high energy bombardment during the sputtering process without melting and deformation, thus ensuring the stability of sputtering and the service life of the target material.

High density: the theoretical density can reach 7.407g/cm³, high density makes the target can provide stable atomic source during sputtering process, which is conducive to the formation of uniform, high-quality film.

Good dimensional stability: Gadolinium Oxide sputtering targets are precision processed and manufactured with good dimensional stability, which is compatible with the installation and fixation of the sputtering equipment to ensure the accuracy and repeatability of the sputtering process.

High purity: Gadolinium Oxide sputtering targets generally have a purity of 99.9% and above, which reduces the impact of impurities on the performance of sputtered films and ensures the quality and performance of the films.

Good chemical stability: it does not react with water at room temperature, but under specific sputtering environment, it can react with other substances to form the required film material.

Oxidation resistance: Gadolinium Oxide sputtering targets have a certain degree of oxidation resistance, but in high temperature and high energy sputtering environments, they still need to be used under vacuum or inert gas protection to prevent oxidation from affecting the performance of the target and the quality of the sputtered film.

Moderate sputtering rate: Gadolinium Oxide sputtering targets have a moderate sputtering rate during the sputtering process, which ensures a high film deposition rate, as well as controlling the thickness and compositional uniformity of the film.

Good film adhesion: The gadolinium oxide film formed by sputtering has good adhesion with the substrate material, which can form a solid film structure and meet the requirements of different application scenarios for film adhesion.

Good compositional homogeneity: Through advanced manufacturing processes, such as powder metallurgy technology, the homogeneity of the internal composition of the target material can be ensured, so as to form a film with homogeneous composition during the sputtering process.

Applications

Optical Coating: Gadolinium Oxide sputtering targets can be used to prepare optical films with high refractive index, such as coating optical components such as eyeglass lenses, optical lenses, lasers, etc., to improve the performance of the optical components, such as to increase the light transmittance and reduce the reflection.

Display devices: in liquid crystal displays (LCD), organic light-emitting diodes (OLED) and other display devices, used in the preparation of transparent conductive film, electrode materials, etc., to improve the display effect and performance of display devices.

Semiconductor manufacturing: In the manufacturing process of semiconductor integrated circuits, it can be used to prepare insulating layers, gate dielectric layers, etc., to improve the performance and reliability of semiconductor devices. For example, as a gate dielectric layer material, it can improve the switching speed and stability of transistors.

Electronic storage devices: used in electronic storage devices such as Magnetoresistive Random Access Memory (MRAM) as magnetic materials or auxiliary materials to improve the storage density and read/write speed of the storage device.

Magnetic material preparation: Gadolinium Oxide sputtering targets can be used to prepare magnetic thin film materials, such as in magnetic storage devices such as hard discs, magnetic heads, magnetic tapes, etc., to improve the performance and stability of magnetic materials.

Magnetic Sensors: in magnetic sensors, as sensitive materials or auxiliary materials to improve the sensitivity and response speed of magnetic sensors.

Fuel cells: in solid oxide fuel cells (SOFC), it can be used to prepare electrolyte film or electrode materials to improve the performance and efficiency of fuel cells.

Solar cells: in the preparation of solar cells, can be used to prepare transparent conductive film, electrode materials, etc., to improve the photoelectric conversion efficiency of solar cells.

High-temperature coating: Gadolinium Oxide sputtering target can be used to prepare high-temperature coating materials due to its good high-temperature stability and oxidation resistance, such as coating on high-temperature parts in aerospace and automobile engines to improve the high-temperature and corrosion-resistant properties of the parts.

Decorative coatings: can be used to prepare coating materials with special optical properties or decorative effects, such as coating on the surface of jewellery, watches, decorative items, etc., to increase the aesthetics and added value of the products.