Gadolinium fluoride target is an important sputtering target with multiple properties and applications.
Composition: the main component is GdF₃, which consists of the elements gadolinium and fluorine.
Appearance: Usually solid flakes, round or other custom shapes.
Density: relatively high, which gives Gadolinium fluoride targets good stability during sputtering.
Melting point: 1231°C.
Hardness: Has a certain degree of hardness to withstand bombardment and abrasion by ions during the sputtering process.
Optical field: it can be used to prepare optical films, such as plating GdF₃ films on optical lenses, filters, laser devices and other optical components, which can improve the performance of optical components, such as increasing the refractive index and improving the optical transmittance.
Electronic field: in the manufacture of electronic devices, GdF₃ target can be used for the preparation of electronic films, such as semiconductor devices, integrated circuits and other electronic components coated with gadolinium fluoride film, can improve the performance of electronic components, such as improving electrical conductivity, enhanced magnetic properties.
Materials science research: Because gadolinium fluoride has unique physical and chemical properties, gadolinium fluoride targets also have important applications in materials science research.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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