Catalogries

Chemical Name:
Fluorine doped Tin Oxide (FTO)
Formula:
SnO2-SnF2
Product No.:
5008500900
CAS No.:
EINECS No.:
Form:
Granules
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
5008500900GN001 SnO2-SnF2 99.99% 3 mm - 12 mm 100g POR Inquire
5008500900GN002 SnO2-SnF2 99.99% 3 mm - 12 mm 100g POR Inquire
Product ID
5008500900GN001
Formula
SnO2-SnF2
Purity
99.99%
Dimension
3 mm - 12 mm
Quantity
100g
Price in €
POR
Product ID
5008500900GN002
Formula
SnO2-SnF2
Purity
99.99%
Dimension
3 mm - 12 mm
Quantity
100g
Price in €
POR

Fluorine doped Tin Oxide (FTO) sputtering target Product Overview

Fluorine doped Tin Oxide (FTO) sputtering targets are essential materials for producing transparent conductive oxide (TCO) thin films. By doping tin oxide (SnO₂) with fluorine, the electrical conductivity is significantly improved while maintaining high optical transparency. This makes FTO sputtering targets widely used in thin film solar cells, touch panels, displays, smart windows, and other optoelectronic devices.

At VIMATERIAL, we supply high-purity FTO sputtering targets with excellent stability, uniform thin film deposition, and customizable dimensions to meet research and industrial-scale demands.

Technical Specifications

Item Specification
Chemical Formula SnO₂:F
Purity 99.99% (4N)
Density 6.95 g/cm³ (theoretical)
Crystal Structure Rutile-type tetragonal (similar to SnO₂)
Form Planar or rotary sputtering targets
Dimensions Custom sizes and shapes available
Backing Plate Bonded or unbonded on request
Sputtering Method DC magnetron sputtering / RF magnetron sputtering

Applications of FTO Sputtering Targets

Solar Cells : Transparent conductive layers in thin film and perovskite photovoltaics

Displays : Flat panel displays, LCDs, OLEDs, and touchscreens

Smart Windows : Low-E coatings and electrochromic glass

Optoelectronics : Transparent electrodes in sensors and devices

Advantages of Our FTO Targets

High electrical conductivity with excellent optical transparency

Stable sputtering rate and uniform thin film deposition

Available in 4N grades with strict impurity control

Customizable dimensions, bonding service, and shapes

Complete documentation and global technical support

Why Choose VIMATERIAL

Professional manufacturer of sputtering targets for TCO materials

Strict quality control with COA, TDS, MSDS provided

Strong R&D and application support for thin film deposition

Short lead time and flexible customization

Trusted by research institutes and industries worldwide

FAQ

Q1: What purity grades are available for FTO sputtering targets?

We offer purity 99.99% (4N) impurity-controlled grades for high-end applications.Purity can also be customized

Q2: Can you provide both planar and rotary FTO targets?

Yes, we manufacture planar and rotary targets with or without backing plates, fully customizable.

Q3: Which sputtering methods are suitable for FTO targets?

Our FTO sputtering targets can be used in DC magnetron sputtering and RF magnetron sputtering systems.

Related Products

ITO (Indium Tin Oxide) Sputtering Target

AZO (Aluminum-doped Zinc Oxide) Sputtering Target

SnO₂ Sputtering Target

Recommended Product

QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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