Catalogries

Chemical Name:
Europium Oxide
Formula:
Eu2O3
Product No.:
630800
CAS No.:
1308-96-9
EINECS No.:
215-165-6
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
630800ST001 Eu2O3 99.95% (REO) Ø 50.8 mm x 6.35 mm 1 POR Inquire
630800ST002 Eu2O3 99.95% (REO) Ø 76.2 mm x 3.175 mm 1 POR Inquire
630800ST003 Eu2O3 99.99% (REO) Ø 25.4 mm x 3.175 mm 1 POR Inquire
Product ID
630800ST001
Formula
Eu2O3
Purity
99.95% (REO)
Dimension
Ø 50.8 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
630800ST002
Formula
Eu2O3
Purity
99.95% (REO)
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
630800ST003
Formula
Eu2O3
Purity
99.99% (REO)
Dimension
Ø 25.4 mm x 3.175 mm
Quantity
1
Price in €
POR

Europium Oxide sputtering target is a material with high purity, suitable density and good chemical stability with europium oxide as the main component. It is used for depositing europium oxide thin film by sputtering process in the fields of electronics, optics, display, etc., in order to make use of the characteristic advantages in fluorescence luminescence, optical filtering, etc.

Characteristic

High purity: This is one of the key characteristics of sputtering targets, high purity europium oxide sputtering targets can ensure the quality and performance of sputtered films. Generally speaking, its purity can reach a high level to meet the requirements of semiconductor, optical and other high-end applications.

High density: Higher density helps to reduce particle splashing during sputtering and improve the uniformity and densification of the film. Higher density targets can also withstand higher sputtering power and improve sputtering efficiency.

Suitable melting and boiling points: Europium oxide has high melting and boiling points of 2350°C and 4118°C respectively, which enables the target to maintain stable structure and performance during sputtering and is not easy to melt or volatilise.

Good chemical stability: at room temperature, europium oxide sputtering target is chemically stable and not easy to react with oxygen and moisture in the air. However, during the sputtering process, due to the bombardment of high-energy particles, it will react chemically with the reactive gases, so as to deposit the required thin film on the substrate.

Good film formation: Europium oxide is able to form uniform and dense films on the substrate, which is very important for applications in optics, electronics and other fields. The quality of the film directly affects the performance and service life of the device.

Unique fluorescent property: Europium oxide is a good red fluorescent material, which can emit strong red fluorescence under UV excitation. Using this property, the prepared films can be applied in fluorescent display, lighting and other fields, which can provide bright colours and high brightness luminescence effect.

Higher refractive index: Europium oxide films have a high refractive index, which makes them potentially valuable in the field of optical coatings, optical waveguides, etc., and can be used to prepare high-performance optical devices.

Applications

Display devices: It can be used to prepare red phosphor for display devices such as colour TV sets, monitors, projectors, etc. It can provide clear and vivid red images and improve display effect and colour reproduction.

Optical coatings: used to manufacture coatings for optical lenses, filters and other optical components, which can achieve selective absorption or transmission of specific wavelengths of light, thus changing the colour or intensity of the light to meet different optical needs.

Optical waveguide: as an optical waveguide material, europium oxide sputtering target can prepare high-performance optical waveguide devices, which are used in optical communication, optical sensing and other fields.

Semiconductor devices: In the process of semiconductor manufacturing, it can be used to prepare semiconductor film, such as in the manufacturing of integrated circuits, europium oxide film can be used as insulating layer, barrier layer, etc. to improve the performance and reliability of semiconductor devices.

Solar cell: applied to the preparation of thin film for solar cell, it can improve the photoelectric conversion efficiency and stability of solar cell.

Electronic memory devices: europium oxide sputtering target can be used to prepare magnetic film or optical storage film, for example, in the manufacture of memory devices such as hard disk, optical disc, etc., which can improve the storage density and read/write speed.

Decorative coating: due to its unique optical properties and chemical stability, it can be used to prepare coatings for high-grade decorative materials, such as decorative coatings on metal surfaces, colour coatings on ceramic products, etc., to increase the aesthetics and added value of products.

Biomedical field: In biomedical field, europium oxide sputtering targets can be used to prepare biosensors, fluorescent markers, etc., providing technical support for disease diagnosis and treatment.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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