Catalogries

Chemical Name:
Cupric (II) Oxide
Formula:
CuO
Product No.:
290801
CAS No.:
1317-38-0
EINECS No.:
215-269-1
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Quantity Price in € Inquiry
290801ST001 CuO 99.9% Ø 50.8 mm x 6.35 mm 1 204.00 Inquire
290801ST002 CuO 99.9% Ø 76.2 mm x 3.175 mm 1 POR Inquire
290801ST003 CuO 99.9% Ø 76.2 mm x 6.35 mm 1 273.00 Inquire
290801ST004 CuO 99.9% Ø 101.6 mm x 3.175 mm 1 POR Inquire
Product ID
290801ST001
Formula
CuO
Purity
99.9%
Dimension
Ø 50.8 mm x 6.35 mm
Quantity
1
Price in €
204.00
Product ID
290801ST002
Formula
CuO
Purity
99.9%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
290801ST003
Formula
CuO
Purity
99.9%
Dimension
Ø 76.2 mm x 6.35 mm
Quantity
1
Price in €
273.00
Product ID
290801ST004
Formula
CuO
Purity
99.9%
Dimension
Ø 101.6 mm x 3.175 mm
Quantity
1
Price in €
POR

Cupric(II) Oxide (CuO) Sputtering Target is a high-purity ceramic sputtering material used to deposit copper oxide thin films for electronic, optoelectronic, semiconductor, photovoltaic, and functional coating applications.

CuO is a black to brown copper oxide with a monoclinic crystal structure, good chemical stability, and semiconducting properties. During sputtering, CuO targets can be used to produce copper oxide thin films with controlled composition and functional properties for different device and coating applications.

VIMATERIAL supplies high-purity Cupric (II) Oxide Sputtering Targets with customized dimensions, shapes, and bonding options according to customer requirements. Contact us for target specifications, availability, and customized requirements.

Physical Properties

Property Value
Chemical Formula CuO
CAS No. 1317-38-0
Molecular Weight 79.55 g/mol
Appearance Black
Crystal Structure Monoclinic
Density 6.32 g/cm³
Melting Point 1326°C
Purity 99.9%
Target Form Planar, rotary, or customized
Dimensions Customized according to requirements
Bonding Unbonded or bonded

*Availability of target forms, dimensions, and bonding options depends on the required specification and production method.

Key Features

  • High Purity
  • Ceramic Target Material
  • Controlled Composition
  • Customized Specifications
  • Batch Consistency

Applications of CuO sputtering targets

  • Electronic and Semiconductor Materials: CuO sputtering targets are used to deposit copper oxide thin films for semiconductor and electronic material applications, including research and development of functional oxide devices.
  • Optoelectronic Applications: CuO thin films can be used in optoelectronic and functional coating applications where controlled optical and electrical properties are required.
  • Photovoltaic Materials: CuO is a p-type semiconductor and can be investigated as a functional material in photovoltaic and solar-energy-related thin-film applications.
  • Functional Thin Films: CuO sputtering targets are suitable for producing copper oxide thin films with controlled thickness and composition for laboratory research, material development, and industrial coating processes.

Quality Control

VIMATERIAL maintains strict quality control throughout the production and supply process.

Cupric (II) Oxide Sputtering Targets can be inspected for chemical composition, purity, dimensions, density, surface condition, and other relevant characteristics according to customer requirements.

Inspection reports can be provided with the products, and batch samples and third-party inspection are available upon request.

Packaging and Storage

Cupric (II) Oxide Sputtering Targets are securely packaged to protect the target surface and prevent contamination or damage during transportation.

Store CuO targets in a dry, clean environment, protected from moisture, contamination, strong acids, and mechanical impact. Keep the original packaging sealed until the target is ready for installation or use.

Custom CuO Sputtering Targets

VIMATERIAL supports customized CuO sputtering targets according to different sputtering systems and application requirements.

Available specifications may include:

  • Target purity
  • Target diameter and dimensions
  • Target thickness
  • Planar or customized target geometry
  • Bonded or unbonded targets
  • Custom packaging
  • Small-batch and research quantities

Please provide your target dimensions, purity requirement, sputtering system, and bonding requirements when requesting a quotation.

Frequently Asked Questions

Q1.What is a CuO sputtering target?

A CuO sputtering target is a high-purity copper(II) oxide ceramic material used as the source material for physical vapor deposition (PVD) and sputtering processes. It is used to deposit CuO thin films onto suitable substrates.

Q2. What is CuO used for in sputtering?

CuO sputtering targets are mainly used for electronic, semiconductor, optoelectronic, photovoltaic, and functional thin-film applications.

Q3. What target sizes are available?

CuO sputtering targets can be supplied in customized dimensions and thicknesses according to the sputtering equipment and customer requirements.

Q4. Are CuO targets available bonded or unbonded?

Both bonded and unbonded configurations may be available, depending on the target design and sputtering system. Please provide your equipment specifications when requesting a quotation.

Recommended Product

QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

Need More Help?

Contact our team of experts today and let us help you with your business!

Contact Us

Contact Us

Contact Us