Copper Silicon Oxide

Copper Silicon Oxide sputtering target is a kind of ceramic compound sputtering target composed of copper, silicon and oxygen elements, which is used for the preparation of relevant thin film materials by magnetron sputtering and other techniques, and has important applications in electronics, optics and other fields.

VIMATERIAL provides high purity Copper Silicon Oxide sputtering targets, we are a professional supplier of inorganic chemical raw materials, our sputtering targets are characterized by high purity, good surface flatness, stable product performance, and good product consistency. We support customized service and binding service, if you have technical problems, please contact us.

Physical Characteristics

Molecular Formula: CuSiO₃

Molecular weight: 143.63

Appearance: usually blue or blue-green powder

Density: about 3.8 g/cm³.

Crystal structure: belongs to orthorhombic crystal system, its crystal structure of copper ions, silicon ions and oxygen ions in accordance with a certain spatial arrangement to form a stable crystal lattice structure, silicon and oxygen tetrahedron is the basic structural unit, the copper ions are distributed in the distribution of its surrounding interactions with the formation of the overall crystal.

Applications

Electronic field: Used in the manufacture of electronic devices, it can play a role in the deposition of the insulating layer of integrated circuit chips, the film formed by sputtering can provide good dielectric properties, which helps to improve the performance and stability of the chip.

Optical field: In optical coating, it can be used for the preparation of optical lenses and filters, etc. The deposited Copper Silicon Oxide film can adjust the refractive index and transmittance of the optical components, effectively reduce the reflected light, increase the light transmittance, and improve the imaging quality of the optical system.

Photovoltaic field: In the manufacture of solar cells, it can be used as a potential buffer layer material. The CuSiO₃ thin film formed by sputtering helps to improve the interfacial performance of the cell, increase the photovoltaic conversion efficiency, and at the same time, enhance the cell’s resistance to environmental factors.

Semiconductor field: As a thin film material in the semiconductor process, it is applied in the passivation layer or multi-layer wiring structure of semiconductor chips, which can enhance the chip’s corrosion resistance and electrical performance, and safeguard the reliability and service life of semiconductor devices.

Quality Control

Each batch of products has a strict quality system to ensure that the complete inspection records, all ex-factory products can be traced, and will provide samples to the customer after the factory, for customers to re-inspection. We have good product consistency and high product reproducibility.

Packaging and Storage

Copper Silicon Oxide sputtering targets are generally protected by double vacuum bags followed by boxes.

Copper Silicon Oxide sputtering targets should be stored in a dry, cool and well-ventilated environment to avoid moisture and oxidation, and to prevent them from contacting with corrosive substances such as acids and alkalis, and at the same time, we should ensure that the temperature of the storage environment is stable, to avoid physical damage to the targets due to temperature changes, and we should take good measures to prevent dust.