Catalogries

Chemical Name:
Copper (I) Iodide
Formula:
CuI
Product No.:
295300
CAS No.:
7681-65-4
EINECS No.:
231-674-6
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
295300ST001 CuI 99.99% Ø 50.8 mm x 3.175 mm 1 POR Inquire
295300ST002 CuI 99.99% Ø 50.8 mm x 6.35 mm 1 POR Inquire
295300ST003 CuI 99.99% Ø 101.6 mm x 3.175 mm 1 POR Inquire
Product ID
295300ST001
Formula
CuI
Purity
99.99%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
295300ST002
Formula
CuI
Purity
99.99%
Dimension
Ø 50.8 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
295300ST003
Formula
CuI
Purity
99.99%
Dimension
Ø 101.6 mm x 3.175 mm
Quantity
1
Price in €
POR

Copper (I) Iodide sputtering target is a sputtering target material made of copper iodide, which is used in magnetron sputtering and other coating techniques to deposit copper iodide thin films on the substrate, and has potential applications in the fields of optics and electronics.

VIMATERIAL supply Copper (I) Iodide sputtering target, high purity and good flatness, high surface finish, we can also provide binding service, we have a professional technical team, especially good at doing a variety of compounds target, if you need to contact us.

Physical Properties

Molecular formula: CuI

Molecular weight: 190.45

Appearance: Off-white powder

Density: 5.62 g/mL at 25 °C

Melting point: 605 °C

Boiling point: 1290 °C

Crystal structure: Typical ionic crystal structure

Applications

Electronic devices: Used in the preparation of conductive films and electrodes in electronic devices to improve the electrical properties of the devices.

Semiconductor field: used as a barrier layer in the manufacturing process of semiconductor chips and as a material for encapsulating metal wiring layers, affecting the transmission speed and stability of the chip.

Photovoltaic field: It is used in the back electrode of thin film solar cells and the conductor layer of heterojunction cells, which helps to improve the performance of the cells.

Flat panel display field: can be used in the preparation of flat panel displays in the metal electrode, transparent conductive electrode and other film layers, to ensure the uniformity of large-area film layer, improve the quality of the display.

Optical field: it can be used in the coating of optical components, such as the preparation of transmittance enhancement film, reflective film, etc., to improve the optical performance of optical components.

Sensor field: it can be used as the coating material on the surface of sensor sensitive elements to enhance the response performance of the sensor to specific substances or physical quantities, and improve the sensitivity and stability of the sensor.

Quality Control

Each batch of products has a strict quality control process, we will provide samples of each batch for customers to re-inspection, but also support customers to specify the third party inspection organisation inspection.

Packaging and storage

Copper (I) Iodide sputtering targets are packed in double vacuum bags.

Copper (I) Iodide sputtering targets should be sealed and stored in a cool, dry, light-proof place away from fire, oxidising agents, strong acids and alkalis.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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