Catalogries

Chemical Name:
Cobalt Silicide
Formula:
CoSi2
Product No.:
271400
CAS No.:
12017-12-8
EINECS No.:
234-616-8
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
271400ST001 CoSi2 99.5% Ø 50.8 mm x 3.175 mm 1 POR Inquire
Product ID
271400ST001
Formula
CoSi2
Purity
99.5%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR

Cobalt Silicide sputtering target is an alloy material mainly composed of cobalt and silicon, usually grey in appearance with metallic luster, with good thermal stability and electrical properties, used in the sputtering coating process, can be used in semiconductors, electronic devices and other fields of the deposition of thin films on the substrate, can effectively improve the performance and stability of the device.

VIMATERIAL offers Cobalt Silicide sputtering targets. Our Cobalt Silicide sputtering targets are characterised by excellent compositional homogeneity, ultra-high purity and excellent sputtering stability, and we can also provide target binding services. We have a professional R&D team and can accept customisation and experiments, please contact us.

Physical properties

Molecular Formula: CoSi₂

Molecular weight: 115.104g/mol

Appearance: usually grey or grey-black solid

Density: about 5.3g/cm³.

Melting point: 1277°C

Crystal structure: cubic crystal system

Applications

Semiconductor field: CoSi₂ sputtering targets are used in large-scale integrated circuits as contact materials to form thin films with good electrical conductivity and thermal stability.

Electronics: CoSi₂ sputtering targets can be used in the manufacture of electronic devices to deposit thin films with low resistivity and high thermal stability, thus improving the performance and reliability of the devices.

Photovoltaics: CoSi₂ sputtering targets can be used in the manufacture of photovoltaic cells to help form thin films with specific properties, thereby improving the conversion efficiency and stability of the cells.

Optics: CoSi₂ sputtering targets can produce thin films with excellent optical properties, which can be used in the manufacture of optical devices such as lenses and filters to improve their optical properties.

Quality Control

Our products are implemented the most stringent quality management system, incoming materials, process, final inspection, factory inspection have strict inspection standards, for the unqualified processing will use strict isolation measures to avoid the flow of non-conforming products into the next process, according to customer requirements will provide customers with samples for customers to re-inspection.

Packaging and Storage

Cobalt Silicide sputtering targets are packed in double vacuum bags and cartons.

Cobalt Silicide sputtering targets should be stored in a dry, well-ventilated environment with stable temperature, avoiding contact with acid, alkali and other corrosive substances, preventing moisture and oxidation, and at the same time avoiding physical collision and extrusion to ensure that its physical and chemical properties are not damaged.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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