Cobalt Iron Oxide sputtering target is a kind of spinel structure magnetic ceramic material composed of cobalt, iron and oxygen, usually black or black-brown in appearance, with high saturation magnetisation strength, high coercivity and good chemical stability. It is mainly used in sputtering coating process, which is capable of depositing high-performance magnetic thin films on the substrate suitable for the fields of magnetic recording, magnetic sensors, and microwave devices.
VIMATERIAL provides Cobalt Iron Oxide sputtering targets . Our Cobalt Iron Oxide sputtering targets are characterised by excellent compositional homogeneity, ultra-high purity and excellent sputtering stability, and we can also provide target binding services. We have a professional R&D team and can accept customisation and experiments, please contact us.
Molecular Formula: CoFe₂O₄
Molecular weight: about 234.63g/mol
Appearance: Usually black or black-brown lustrous target material.
Density: about 5.3 g/cm³ or so.
Crystal structure: It belongs to cubic crystal system spinel structure. In the crystal, oxygen ions are face-centred cubic and closely packed, Co²⁺ and Fe³⁺ ions occupy the tetrahedral and octahedral interstitial positions respectively, and this structure endows it with good magnetic properties and chemical stability.
Magnetic recording field: high coercivity magnetic films can be deposited in the manufacture of magnetic recording media, effectively enhancing the density and stability of data storage.
Magnetic sensors: Used in the preparation of magnetic sensors, the deposited thin film can keenly sense changes in the magnetic field and achieve high-precision detection of physical quantities and signal conversion.
Microwave devices: In microwave devices, the films made from this target can adjust the electromagnetic characteristics and optimise the transmission, reflection and absorption of microwaves.
In the field of electronic devices, the thin films can provide special magnetic properties for electronic devices, which can help improve the performance and miniaturisation of components such as inductors and transformers.
Our products are implemented the most stringent quality management system, incoming materials, process, final inspection, factory inspection have strict inspection standards, for the unqualified processing will use strict isolation measures to avoid the flow of non-conforming products into the next process, according to customer requirements will provide customers with samples for customers to re-inspection.
Cobalt Iron Oxide sputtering targets are packed in double vacuum bags and cartons.
Cobalt Iron Oxide sputtering targets should be stored in a dry, cool and well-ventilated environment, avoiding contact with corrosive chemicals such as acids and alkalis, preventing moisture, oxidation and contamination by impurities, and avoiding physical collision, friction and heavy pressure to maintain its chemical stability and physical properties.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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