| Product ID | Formula | Purity | Dimension | Quantity | Price in € | Inquiry |
|---|---|---|---|---|---|---|
| 27260500ST001 | CoFeB (60:20:20at%) | 99.9% | Ø 50.8 mm x 3.175 mm | 1 | POR | Inquire |
| 27260500ST002 | CoFeB (60:20:20at%) | 99.9% | Ø 100 mm x 3 mm | 1 | POR | Inquire |
| 27260500ST003 | CoFeB (20:60:20at%) | 99.9% | Ø 100 mm x 3 mm | 1 | POR | Inquire |
| 27260500ST004 | CoFeB (40:40:20at%) | 99.9% | 162.35 mm x 130 mm x 3 mm | 1 | POR | Inquire |
Cobalt Iron Boron sputtering target is a soft magnetic alloy composed of cobalt, iron, and boron. CoFeB is widely used for depositing magnetic thin films due to its high magnetic permeability, suitable saturation magnetization, low coercivity, and excellent magnetic properties.
VIMATERIAL supplies high-purity CoFeB sputtering targets with excellent compositional uniformity, high density, and stable sputtering performance. Different Co:Fe compositions, target dimensions, and configurations can be customized according to specific deposition and application requirements. We also provide sputtering target bonding services, material customization, and technical support for research and industrial applications. Contact us for more information.
| Property | Description |
| Material | Cobalt Iron Boron |
| Abbreviation | CoFeB |
| Composition | 60:20:20at%, 20:60:20at%, 40:40:20at%; customizable |
| Appearance | Metallic-grey to dark grey |
| Material Type | Soft magnetic alloy |
| Purity | 99.9% |
| Target Shape | Circular, rectangular, or customized |
| Dimensions | Customized |
| Backing Plate | Available upon request |
Note: CoFeB is an alloy rather than a fixed-stoichiometry compound. Its composition, density, and magnetic properties depend on the Co:Fe ratio and manufacturing process. Please contact VIMATERIAL for detailed specifications of a specific CoFeB target.
Magnetic Tunnel Junctions (MTJs): CoFeB is widely used to deposit magnetic electrode and free-layer materials in magnetic tunnel junctions (MTJs). Its magnetic properties and compatibility with thin-film processing make it an important material for advanced magnetic device fabrication.
MRAM and Spintronic Devices: CoFeB sputtering targets are used to prepare magnetic layers for magnetoresistive random-access memory (MRAM) and other spintronic devices. CoFeB-based thin films can provide controlled magnetic switching and spin-dependent transport properties for non-volatile memory and spintronic applications.
Magnetic Sensors: CoFeB thin films can be used in magnetic sensors and magnetoresistive devices, where controlled magnetic properties, film uniformity, and stable deposition are required for magnetic signal detection and conversion.
Magnetic Recording and Electronic Devices: CoFeB and related magnetic alloys can be used in magnetic thin-film structures for data-storage technologies, magnetic components, and advanced electronic devices where suitable magnetic response and thin-film uniformity are required.
VIMATERIAL applies strict quality control throughout the manufacturing process, including raw material inspection, process control, composition analysis, dimensional inspection, and final quality inspection.
Each CoFeB sputtering target is manufactured according to defined quality requirements to ensure consistent composition, surface quality, dimensional accuracy, and sputtering performance. Inspection reports and samples can be provided upon request for customer evaluation.
CoFeB sputtering targets are typically packaged in double vacuum-sealed bags and protective cartons or cases to minimize exposure to moisture, oxygen, dust, and other contaminants.
Store CoFeB targets in a clean, dry, and well-ventilated environment with stable temperature and humidity. Avoid contact with water, moisture, corrosive substances, and contaminants. Handle carefully to prevent impact, scratching, deformation, or excessive mechanical stress.
VIMATERIAL provides custom CoFeB sputtering targets for specific research, laboratory, and industrial deposition requirements. Customization options include:
Our technical team can support target development, material customization, sputtering experiments, and application-specific requirements.
A CoFeB sputtering target is a cobalt-iron-boron alloy target used to deposit magnetic thin films by sputtering. CoFeB is particularly important in MTJ, MRAM, spintronic, magnetic sensor, and other advanced magnetic applications.
CoFeB sputtering targets are mainly used to deposit magnetic layers and electrodes for magnetic tunnel junctions (MTJs), MRAM, spintronic devices, magnetic sensors, and other magnetic thin-film structures.
Yes. VIMATERIAL provides customized Co:Fe:B compositions, purity levels, target dimensions, thicknesses, and geometries according to specific deposition processes and application requirements. Circular, rectangular, and other customized target shapes are available, with backing plate configurations also available upon request.
Yes. VIMATERIAL provides sputtering target bonding services and can supply bonded CoFeB targets according to the customer’s sputtering equipment and backing plate requirements.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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