Catalogries

Chemical Name:
Cobalt Iron Boron
Formula:
CoFeB
Product No.:
27260500
CAS No.:
EINECS No.:
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
27260500ST001 CoFeB 99.5% Ø 50.8 mm x 3.175 mm 1 POR Inquire
Product ID
27260500ST001
Formula
CoFeB
Purity
99.5%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR

Cobalt Iron Boron sputtering target is an alloy of Cobalt, Iron and Boron with metallic appearance and silver-grey colour. It has good soft magnetic properties, high permeability and saturation magnetisation strength, and is mainly used in sputtering coating process, which is capable of depositing high-performance magnetic thin films on the substrate suitable for electronics, magnetic storage and other fields.

VIMATERIAL offers Cobalt Iron Boron sputtering targets . Our Cobalt Iron Boron sputtering targets are characterised by excellent compositional homogeneity, ultra-high purity and excellent sputtering stability, and we can also provide target binding services. We have a professional R&D team and can accept customisation and experiments, please contact us.

Physical properties

Molecular formula: CoFeB

Molecular weight: about 135.943

Appearance: silver grey metallic luster target

Density: about 0.986 g/cm³.

Applications

Semiconductor field: used in semiconductor chip manufacturing wafer conductive layer, barrier layer and metal gate production.

Magnetic recording field: as a magnetic recording target, it can be used in the manufacture of optical discs, mechanical hard disks and other storage media, in order to achieve high storage density, high transmission speed and high life span of data storage.

Electronic devices: It can be used to prepare magnetic films for various electronic devices, such as magnetic sensors, magnetic heads, transformer cores and magnetic rings, etc., and its soft magnetic properties can be used to achieve signal conversion, transmission and storage functions.

Display field: In the flat panel display industry, it can be used to manufacture films with specific properties, such as transparent conductive film, electrode film, etc., which helps to improve the performance and quality of the display device.

Photovoltaic field: applied to photovoltaic thin film battery, can form a barrier layer, conductive layer and transparent conductive layer, etc., to improve the performance and efficiency of the battery.

Quality Control

Our products are implemented the most stringent quality management system, incoming materials, process, final inspection, factory inspection have strict inspection standards, for the unqualified processing will use strict isolation measures to avoid the flow of non-conforming products into the next process, according to customer requirements will provide customers with samples for customers to re-inspection.

Packaging and Storage

Cobalt Iron Boron sputtering targets are packed in double vacuum bags and cartons.

Cobalt Iron Boron sputtering targets should be stored in a dry, well-ventilated environment with stable temperature and no strong magnetic field interference, avoiding contact with corrosive substances, preventing moisture, oxidation and contamination with impurities, and at the same time, preventing from violent collision and heavy pressure in order to keep its physical and chemical properties from being damaged.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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