Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy sputtering target is a kind of alloy target composed of chromium, molybdenum, tantalum, titanium, vanadium, tungsten and many other metals, which has a high melting point, high hardness, good corrosion resistance and abrasion resistance, and it can be used to prepare many kinds of high-performance thin films to meet the needs of the electronics, aerospace and other fields.
VIMATERIAL provides Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy sputtering targets, which have the advantages of high purity, high density, high melting point, and the ability to form high-quality and stable thin films. We can provide target binding service and we have a professional technology research and development team, accept any product customisation and experiment, if you need please contact us.
Molecular formula: CrMoTaTiVW
Appearance: silver grey target
Semiconductor field: used in the preparation of semiconductor chips in the barrier layer and contact layer film, can improve the performance and stability of the chip, to ensure the normal operation of the integrated circuit.
Flat-panel display field: it can be used to form transparent conductive films and electrodes on flat-panel displays, which can help to improve the display effect and reduce energy consumption, for example, it plays an important role in the manufacture of OLED screens.
Solar photovoltaic field: used in the preparation of solar cells in the film, can improve the photoelectric conversion efficiency and stability of the battery, help the development of solar photovoltaic power generation technology.
Optical field: Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy can be in the optical lens, laser equipment and other optical components on the preparation of high hardness, wear resistance and anti-reflection film, can improve the performance and service life of optical components, such as in the high-end camera lens coating applications.
VI HALBLEITERMATERIAL GmbH is committed to high quality control and batch consistency in support of the overall objectives of REACH through the adoption of a rigorous quality assurance system, strict quality control at all stages of the production chain, adherence to the principle of reworking and redoing of defective products, testing and releasing batches in accordance with detailed specifications, adherence to the highest standards in all areas, handling of problems in accordance with the 8D process, compliance with REACH and compliance with related standards.
We are committed to achieving high quality control and batch consistency in support of the overall objectives of REACH, as well as maintaining documentation and batch traceability to create a socially responsible supply chain that ensures the delivery of high quality products and services.
Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy sputtering targets are packed in double-layer vacuum bags and then boxed, and the outer box is packed in cartons.
Chromium Molybdenum Tantalum Titanium Vanadium Tungsten alloy sputtering targets should be stored in a dry, clean, well-ventilated environment with relatively stable temperature and humidity to avoid moisture, oxidation, corrosion and mechanical damage.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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