Boron Oxide Sputtering Target (B₂O₃) is a target material used in the sputtering process to deposit thin films of boron oxide onto a substrate, typically in applications such as electronics, optics, coatings, and semiconductor manufacturing. Sputtering is a physical vapor deposition (PVD) technique where atoms are ejected from a solid target by energetic ions and subsequently deposit onto a substrate to form a thin film.
Chemical formula：B2O3
Molar mass：69.6182 g/mol
Appearance：white, glassy solid
Density: Around 2.46 g/cm³ for the solid form.
Melting Point: Boron oxide has a melting point of approximately 450°C (for amorphous form).
Boiling Point: The boiling point for boron oxide is about 3000°C (in the vapor phase).
Hardness: Hard, brittle material, so care should be taken to prevent cracking or damage.
Solubility: Reacts with water to form boric acid (H₃BO₃), and it is soluble in both water and alkaline solutions.
Purity: Available in various purity grades, typically ranging from 99% to 99.9% or higher for specialized applications.
Form: Typically a flat, circular, or cylindrical disk or plate. Some targets may have a backing plate for easier attachment to the sputtering system.
Thin Film Deposition: Used to deposit boron oxide sputtering targets for applications in electronics, optics, and coatings. Boron oxide films can be used as dielectric layers, insulation coatings, or protective barriers.
Optical Coatings: Boron oxide sputtering targets are used in optical devices for their unique refractive properties and ability to form stable coatings with high durability.
Semiconductor Manufacturing: Boron oxide sputtering targets are used in the deposition of thin films for electronic devices, particularly for doping processes or for creating insulating layers in semiconductor components.
High-Performance Coatings: Boron oxide sputtering targets is used in the production of hard coatings that provide wear resistance, corrosion resistance, and high-temperature stability, especially in aerospace, automotive, and industrial applications.
Glass and Ceramic Manufacturing: Boron oxide films deposited via sputtering are used in the production of special glass or ceramic materials, such as borosilicate glass, which is known for its low thermal expansion and high resistance to thermal shock.
Protective Equipment: When handling boron oxide sputtering targets, it is important to wear appropriate personal protective equipment (PPE), such as gloves, goggles, and a dust mask or respirator to prevent inhalation of particles.
Storage: Store boron oxide targets in a dry, cool environment to prevent moisture absorption. Boron oxide is hygroscopic and will react with water to form boric acid, which can alter the target’s properties.
First Aid: If contact with the skin occurs, wash thoroughly with water. If inhaled in significant amounts, move to fresh air and seek medical attention if necessary.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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