Bismuth Oxide

Bismuth Oxide sputtering targets

Bismuth oxide  sputtering targets are used in thin-film deposition techniques such as physical vapor deposition (PVD), specifically magnetron sputtering, to create thin coatings of Bi₂O₃ on various substrates. These thin films are commonly used in electronics, optics, and energy applications.

Properties

Purity: Typically available in high purities (99.9% to 99.999%) to ensure high-quality thin films.
Density: ~8.9 g/cm³.
Melting Point: 817°C.
Electrical Properties: Bismuth oxide  sputtering targets can be semiconductive, with a bandgap of ~2.8 eV.
Form: Available as circular, rectangular, or custom-shaped targets, depending on the sputtering system.

Applications

Electronics:Used to deposit thin films for the production of electronic components like varistors, capacitors, and resistors. Important for thin-film transistors (TFTs) and other semiconductor devices.
Optics:Bismuth oxide  sputtering targets enhance optical properties such as refractive index, transparency, and reflectivity. Used in optical filters, lenses, and mirrors due to its high refractive index.
Energy Applications:Thin films of Bi₂O₃ are employed in solid oxide fuel cells (SOFCs) and other energy-related devices for their ionic conductivity.
Photocatalysis:Bi₂O₃ thin films have photocatalytic properties, enabling them to degrade organic pollutants when exposed to light.
Sensors:Used in gas sensors due to its sensitivity to various gases, including oxygen and nitrogen oxides.

Advantages

Non-toxic and lead-free: Bismuth oxide is a safer alternative to lead-based materials in electronics and coatings.
Thin-film versatility: Allows for precise control over the thickness and composition of the deposited layer, which is crucial for fine-tuning electrical and optical properties.