Bismuth Iron Titanium Oxide

Bismuth Iron Titanium Oxide sputtering target is a ceramic compound target used in the sputtering coating process to deposit bismuth, iron, titanium, oxygen, and other elements contained therein as a thin film on a substrate, and it is a key material with potential applications in semiconductors, electronic devices, optics, and many other fields.

Characteristics

Composition: Bismuth Iron Titanium Oxide sputtering targets are mainly composed of bismuth (Bi), iron (Fe), titanium (Ti), oxygen (O) and other elements, and the proportion of each element may vary according to the specific application requirements and preparation process. For example, the presence of bismuth may give the target some special electrical or optical properties; titanium helps to improve the hardness and stability of the target; the addition of iron may affect the target’s magnetic properties and other physical properties.

High purity: In general, high quality Bismuth Iron Titanium Oxide sputtering targets need to have a high purity, usually above 99%, to ensure the quality and performance of sputtered films. High purity reduces the adverse effects of impurities on film properties and improves film uniformity and stability.

High Density: Bismuth Iron Titanium Oxide targets have a high density, which helps to reduce the presence of porosity, increase the density of sputtered particles, and reduce discharge phenomena, thereby ensuring film performance. A high density target allows for a more stable sputtering process and a more uniform thickness and composition of the film.

Good dimensional accuracy: According to different application requirements, Bismuth Iron Titanium Oxide targets can be processed into various shapes and sizes, such as round, square, rectangle, etc., and have high dimensional accuracy, which can meet the requirements of different equipment and processes.

Uniform microstructure: Its microstructure is uniform, with smaller grain size and uniform distribution. This is conducive to improving the sputtering rate and the quality of the film, and reducing the defects and stresses in the film.

Good chemical stability: it has good chemical stability at room temperature and pressure, but in the sputtering process, due to the bombardment of high-energy ions, a chemical reaction occurs and the corresponding oxide film is formed. This chemical reaction is the basis of sputter coating, which enables the elements in the target material to be effectively deposited on the substrate.

Oxidation Resistance: Bismuth Iron Titanium Oxide has a certain degree of oxidation resistance, but oxidation may still occur at elevated temperatures or in certain environments. Therefore, care needs to be taken to avoid contact between the target and oxygen during storage and use to prevent oxidation.

Moderate resistivity: Bismuth Iron Titanium Oxide has a moderate resistivity, which ensures the effective generation of plasma during sputtering and avoids excessive energy loss due to high resistance.

Dielectric properties: Bismuth Iron Titanium Oxide has certain dielectric properties which are important for applications such as electronics. For example, in the preparation of electronic components such as capacitors, the dielectric properties of the target material will affect the performance and stability of the capacitor.

Specific optical bandgap: Bismuth Iron Titanium Oxide has a specific optical bandgap, which makes thin films prepared by sputtering suitable for a wide range of applications in the field of optics. For example, in the preparation of optical coatings, solar cells, etc., the optical properties of the target material can determine the optical properties of the film, such as transmittance and reflectance.

Low thermal conductivity: Bismuth Iron Titanium Oxide has a relatively low thermal conductivity, which means that the target can maintain good temperature stability during the sputtering process and is not easily affected by heat and deformed or damaged.

High Temperature Resistance: Bismuth Iron Titanium Oxide has high high temperature resistance and is able to maintain a stable structure and performance under high temperature conditions. This is very important for some processes that require sputter coating under high temperature conditions.

Applications

Semiconductor devices: It can be used to prepare semiconductor thin films, such as in the manufacturing process of semiconductor chips, by sputter coating to form specific functional layers, which helps to improve the performance and stability of semiconductor devices. Its unique electrical properties can provide suitable electrical characteristics for semiconductor devices, such as adjusting resistance, capacitance and other parameters, which is important for the development of semiconductor integrated circuits.

Ferroelectric memory: The target material can be used to prepare ferroelectric thin films for applications in ferroelectric random access memory (FeRAM). Ferroelectric materials have spontaneous polarisation phenomenon, and the direction of polarisation can be reversed by applying an electric field, this characteristic makes the ferroelectric memory has the advantages of non-volatility, high read/write speed and low power consumption, etc., and the Bismuth Iron Titanium Oxide sputtering target can provide high-quality ferroelectric thin film materials for ferroelectric memory.

Sensors: Based on their good electrical and physical properties, they can be used to manufacture a variety of sensors, such as pressure sensors and temperature sensors. For example, using its piezoelectric effect, when subjected to external forces will generate charge signals, can be used to detect pressure changes; its resistance with the change of temperature characteristics can also be used to make temperature sensors.

Optical coatings: can be used to prepare optical film coatings, such as anti-reflective coatings, transmission-enhancing coatings. These coatings can be applied to optical devices such as optical lenses, lenses, displays, etc., to increase the light transmittance of the optical device and reduce reflection, thus improving the optical performance. For example, a thin film coating of this material on the lenses of eyeglasses can reduce the reflection of light and make the wearer’s vision clearer.

Nonlinear Optical Devices: Because Bismuth Iron Titanium Oxide has specific optical nonlinear properties, it can be used to make nonlinear optical devices, such as frequency doublers and optical modulators. These devices have important applications in laser technology, optical communications, etc., and are capable of modulating and converting the frequency and intensity of laser light.

Solar Cells: can be used to prepare functional layers for solar cells, such as light absorption layer, charge transport layer, etc.. Its suitable energy band structure and optical properties can improve the photoelectric conversion efficiency of solar cells, which is important for the efficient use of solar energy.

Fuel cell: In fuel cells, the target can be used to prepare electrode materials or catalyst carriers for fuel cells. Its good chemical stability and electrical properties help to improve the performance and life of fuel cells and promote the development of fuel cell technology.

Decorative coating: it can be used to prepare decorative coatings with special colour, gloss or texture, which are applied in the fields of jewellery, watches, decorations, etc. to increase the aesthetics and added value of products.

High-temperature coatings: due to its high temperature resistance, it can be used to prepare coatings for use in high-temperature environments, such as engine parts in the aerospace field, coatings for high-temperature stoves, etc. It can play a role in protecting the substrate material, improving corrosion resistance and high-temperature resistance.