Catalogries

Chemical Name:
Bismuth Germanium Oxide (BGO)
Formula:
Bi4Ge3O12
Product No.:
83320800
CAS No.:
12233-56-6
EINECS No.:
235-457-7
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
83320800ST001 Bi4Ge3O12 99.99% Ø 50.8 mm x 3.175 mm 1 POR Inquire
83320800ST002 Bi4Ge3O12 99.99% Ø 50.8 mm x 6.35 mm 1 POR Inquire
83320800ST003 Bi4Ge3O12 99.99% Ø 76.2 mm x 3.175 mm 1 POR Inquire
83320800ST004 Bi4Ge3O12 99.99% Ø 101.6 mm x 3.175 mm 1 POR Inquire
Product ID
83320800ST001
Formula
Bi4Ge3O12
Purity
99.99%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
83320800ST002
Formula
Bi4Ge3O12
Purity
99.99%
Dimension
Ø 50.8 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
83320800ST003
Formula
Bi4Ge3O12
Purity
99.99%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
83320800ST004
Formula
Bi4Ge3O12
Purity
99.99%
Dimension
Ø 101.6 mm x 3.175 mm
Quantity
1
Price in €
POR

Bismuth Germanium Oxide  target is an important functional material target.

Basic information:

Chemical formula: Bi₄Ge₃O₁₂.
Crystal structure: with cubic ewerite crystal structure
Appearance: usually solid flake or round target, generally off-white or light yellow.

Chemical properties:

Stability: it is relatively stable at room temperature and pressure, but in some special chemical environments, such as strong acids and bases, chemical reactions may occur.

Oxidising properties: the bismuth and germanium elements therein have certain oxidising properties, and can be involved as oxidising agents in some reactions, but in the application process of the target, such oxidising properties usually do not have a negative impact on its performance.

Application field:

Optical field: Bismuth Germanium Oxide is able to emit green fluorescence under the action of high-energy particles or high-energy rays (e.g., β-rays and X-rays), its targets can be used for the preparation of optical films, which are used, for example, in scintillator materials and fluorescent screens.

Semiconductor field: Can be used in the manufacture of semiconductor devices, such as in integrated circuits, optoelectronic devices and other aspects of the thin film deposition process, as a sputtering target material to prepare films with specific functions, these films can improve the performance of semiconductor devices.

Electronics: In the field of electronics, Bi₄Ge₃O₁₂ targets can be used in the preparation of insulating or protective layers for electronic components to improve the performance and reliability of electronic components.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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