Catalogries

Chemical Name:
Barium Zirconate (Barium Zirconium Oxide)
Formula:
BaZrO3
Product No.:
56400800
CAS No.:
12009-21-1
EINECS No.:
234-546-8
Form:
Sputtering Target
HazMat:

MSDS

TDS

Product ID Formula Purity Dimension Quantity Price in € Inquiry
56400800ST001 BaZrO3 99.9% Ø 50.8 mm x 3.175 mm 1 POR Inquire
56400800ST002 BaZrO3 99.9% Ø 76.2 mm x 3.175 mm 1 POR Inquire
Product ID
56400800ST001
Formula
BaZrO3
Purity
99.9%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
56400800ST002
Formula
BaZrO3
Purity
99.9%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR

1.Barium Zirconate (BaZrO₃) Sputtering Target Meta Description

High-purity Barium Zirconate (BaZrO₃) sputtering targets for advanced thin film deposition. Suitable for functional ceramics, electronic devices, and optical coatings. Available in various shapes and sizes with custom specifications.

2.Product Overview of BaZrO₃ Sputtering Target

Barium Zirconate (BaZrO₃) sputtering target is a high-performance ceramic material primarily used for the fabrication of advanced functional thin films. It exhibits excellent chemical and thermal stability, along with a high dielectric constant, and is widely used in electronic devices, optical coatings, fuel cells, and sensors.

3.Key Features:

High Purity  99.9%

Uniform and dense structure for optimized film growth

Excellent thermal and chemical stability

Suitable for both direct current (DC) and radio frequency (RF) sputtering

Available in a variety of shapes: round, square, and custom shapes

4.Technical Specifications

Item Parameters
Chemical formula BaZrO₃
Appearance White dense ceramic target
Purity  99.9%
Density ≥ 6.0 g/cm³
Shape Round/square/shaped targets
Sputtering method DC & RF
Packaging Moisture-proof vacuum bag + wooden box
Usage scenarios Functional ceramic films
Capacitors
Battery materials
Optical coatings

5.Applications

Functional Ceramic Films

High Dielectric Constant Capacitors

Superconducting and Fuel Cell Materials

Optical Coatings and Sensors

Microelectronics and MEMS Devices

6.Why choose our BaZrO₃ sputtering targets?

High-purity materials: Use high-purity raw materials to reduce impurities and improve film quality.

Precision processing: Advanced isostatic pressing and high-temperature sintering processes ensure dense and uniform targets.

Multiple specifications available: Custom sizes and shapes are available to meet both laboratory and industrial needs.

Professional technical support: Provides advice on optimizing sputtering process parameters to help improve film performance.

Global shipping: Secure packaging ensures product protection during transportation.

7.Tips for Sputtering

Pretreatment: Before use, it is recommended to clean the target surface to remove dust and contaminants.

Storage: Store in a dry environment, avoiding moisture and acidic environments.

8. Packaging and Shipping

Targets are packaged in moisture-proof packaging.

Individual vacuum-sealed bags and shock-resistant wooden boxes.

Customized export packaging is available upon request.

9.Other related products

Barium Zirconate Powder  Barium Oxide  Barium Fluoride Barium Vanadium Oxide

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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