Aluminum Nitride

Aluminum Nitride Sputtering Target (AlN) is a high-purity material used in physical vapor deposition (PVD) processes, particularly sputtering, to create thin films of aluminum nitride on various substrates. Known for its excellent thermal conductivity, high electrical insulation, and durability, AlN thin films are widely applied in electronic, optical, and semiconductor industries. Aluminum nitride sputtering target’s composition and manufacturing quality are crucial to achieving uniform and defect-free coatings.

Composition and Purity:

Aluminum Nitride (AlN): Composed of aluminum and nitrogen, AlN targets offer high thermal conductivity and electrical insulation.

High Purity (Typically ≥ 99.5%): High-purity AlN targets are essential for achieving high-quality, contamination-free thin films, which is critical in semiconductor and electronics applications.

Physical and Thermal Properties:

High Thermal Conductivity: AlN offers one of the highest thermal conductivities among ceramics, providing excellent heat dissipation for thin films in electronics.

Electrical Insulation: AlN’s insulating properties make it ideal for films that require electrical isolation, such as in semiconductor devices.

Durable and Resistant to Thermal Stress: Aluminum nitride sputtering targets are stable at high temperatures, making them suitable for sustained deposition processes.

Applications:

Semiconductor Industry: AlN films are used as insulating layers in semiconductor devices, enhancing performance by preventing current leakage.

Thin-Film Transistors (TFTs) and LEDs: AlN is used in thin-film transistors and LED substrates, where its thermal conductivity aids in heat dissipation, extending the device’s operational life.

Surface Acoustic Wave (SAW) Devices: AlN’s piezoelectric properties make it suitable for SAW filters, commonly used in RF filters and wireless communication systems.

Optoelectronics and Optical Coatings: AlN thin films are valued in optoelectronics for their transparency and compatibility with optical devices.

Handling and Storage:

Fragility: Aluminum nitride sputtering targets, though durable under deposition conditions, can be brittle. Careful handling is necessary to prevent chips or fractures.

Moisture Control: AlN is mildly susceptible to hydrolysis in humid environments, so storing targets in a dry, controlled environment is recommended to maintain purity and performance.