Chromium Nickel Alloy sputtering target is a kind of magnetron sputtering target composed of chromium and nickel with the characteristics of high purity, moderate density and high melting point, which is widely used in the fields of electronics, optics, abrasion and corrosion resistance, and medical treatment.
VIMATERIAL provides 99.9% pure Chromium Nickel Alloy sputtering targets, our Chromium Nickel Alloy sputtering target have the characteristics of high purity, high density, fine and uniform grain size, etc. We can provide target binding service. We have a professional technology research and development team, accept any product customisation and experiment, if you need please contact us.
Molecular formula: CrNi
Molecular weight: about 110.69
Appearance: Usually silver-coloured target
Density: about 8.40 g/mL
Melting point: approx. 1450°C
Crystal structure: Face-centred cubic crystal structure. In this structure, chromium and nickel atoms are closely arranged in the crystal lattice to form an ordered three-dimensional periodic structure with high symmetry and stability, enabling the target to provide a stable supply of atoms for thin-film deposition during the sputtering process
Electronics: CrNi sputtering targets are used in the manufacture of semiconductor chips to form high-precision resistive layers, which precisely regulate the current for the circuits within the chip and ensure stable operation.
Display technology: In the production of liquid crystal displays, electrode films with good conductivity and stability are prepared through the sputtering process to improve screen touch response and display clarity.
Optical instruments: for telescopes, microscopes and other optical lenses coating, reduce surface reflection, enhance light transmission, help to obtain a clearer and more accurate optical image.
Automobile manufacturing: sputtering deposition coating on pistons, valves and other parts of automobile engines to enhance wear resistance, reduce friction loss, and improve the overall performance and reliability of the engine.
VI HALBLEITERMATERIAL GmbH is committed to high quality control and batch consistency in support of the overall objectives of REACH through the adoption of a rigorous quality assurance system, strict quality control at all stages of the production chain, adherence to the principle of reworking and redoing of defective products, testing and releasing batches in accordance with detailed specifications, adherence to the highest standards in all areas, handling of problems in accordance with the 8D process, compliance with REACH and compliance with related standards.
We are committed to achieving high quality control and batch consistency in support of the overall objectives of REACH, as well as maintaining documentation and batch traceability to create a socially responsible supply chain that ensures the delivery of high quality products and services.
Chromium Nickel Alloy sputtering targets are packed in double vacuum bags and then boxed, and the outer box is packed in cartons.
Chromium Nickel Alloy sputtering targets should be stored in a dry, cool, well-ventilated environment without corrosive gases, avoiding moisture, dust and corrosive substances, and preventing from violent collision, extrusion or friction, and preferably in sealed packages on special storage racks.
VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.
Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.
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