
How to make sputtering target?
Sputtering targets are materials used for thin film deposition. Sputtering technology is used to sputter material atoms or molecules from solid targets and then form
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Sputtering targets are materials used for thin film deposition. Sputtering technology is used to sputter material atoms or molecules from solid targets and then form

YSZ (ytria – stabilized Zirconia) is a ceramic material composed of zirconium dioxide (ZrO₂) stabilized by yttria (y₂O₃). By adding yttria, the phase transition temperature range of zirconium dioxide is changed to produce cubic and

Sputtering targets are materials used to prepare thin films. They are mainly used in the sputtering process of physical vapor deposition (PVD) technology. As the source of materials, sputtering targets themselves are generally metals or

Sputtering target is a physical vapor deposition technology. It is a process in which ions generated by an ion source are accelerated and gathered in a vacuum to form a high-speed ion beam, bombarding the

VI HALBLEITERMATERIAL GmbH offers a comprehensive range of high-purity, high-performance evaporation materials. These materials are instrumental in achieving the requisite coating properties. Our inventory includes a variety of shapes (such as granules, pellets, shots, tablets,

Sputtering targets are materials used for thin film deposition. Sputtering technology is used to sputter material atoms or molecules from solid targets and then form thin films on substrates. Sputtering targets are widely used in