Chromium sputtering targets are PVD (Physical Vapor Deposition) materials made from high-purity chromium (typically ≥99.95%) and widely used in magnetron sputtering and related coating processes. Chromium, a silver-white transition metal, holds a special place in materials science—not only for its high hardness and exceptional corrosion resistance but also for its key roles in stainless steel manufacturing, high-strength alloys, electroplating, and pigment production.
In thin-film materials and the microelectronics industry, chromium is especially critical. As a key “source material” for sputter deposition, Chromium targets improve film uniformity and quality while ensuring reliable performance in high-precision electronic components.
I. What is a Chromium Sputtering Target?
A chromium sputtering target is produced using high-purity metallic chromium through powder metallurgy, vacuum melting, hot pressing, forging, and other precision processes. The resulting block or tubular material is primarily used in PVD sputtering. When bombarded by energetic ions, chromium atoms are ejected from the target surface and deposited onto the substrate, forming a uniform and dense Cr film that provides corrosion resistance, high hardness, electrical conductivity, and other essential properties.
Key performance parameters include:
1) Purity: Cr targets typically reach 99.95% or higher purity. Fewer impurities result in improved electrical and optical properties of the deposited film. For advanced semiconductor applications, purity can exceed 99.995%, effectively preventing impurity ion interference during deposition.
2) Density: The ideal Cr target should approach chromium’s theoretical density (≈7.19 g/cm³). High density ensures a stable sputtering rate and better film uniformity.
3) Grain Size: Optimal grain size is in the micron range. Fine grains contribute to smoother, more uniform films, improving mechanical performance and corrosion resistance.
4) Electrical & Thermal Conductivity: Cr films offer excellent corrosion resistance (withstanding acidic and alkaline environments) and high hardness (HV ≈ 800). Good electrical and thermal conductivity improve sputtering efficiency and help maintain stable target temperature, making Cr suitable for coatings on glass, silicon wafers, and metal substrates.
II. What's the application of Chromium Sputtering Targets?
Chromium targets are widely used across industries—from basic manufacturing to cutting-edge technologies—matching performance requirements in each application.
1) Semiconductor Industry: The “Shield” of Integrated Circuits
In semiconductor fabrication, Cr targets are commonly used to produce conductive and barrier layers.
As a conductive metal layer, Cr films ensure efficient electron transport and reduced signal loss.
As a diffusion barrier, a 0.05–0.1 μm Cr layer on lead frames prevents copper and other ions from diffusing into silicon, protecting device performance.
In advanced processes at 7 nm and below, the microstructural uniformity of high-purity Cr targets directly impacts chip yield and reliability.
2) Display Panels: The “Guardian” of Image Quality
Chromium targets are used in LCD and OLED manufacturing for black matrix (BM) layers and gate electrodes.
Black Matrix (BM): Cr films provide >95% light-blocking capability and high patterning resolution, improving contrast and color saturation.
Gate Electrodes: Cr’s low resistivity and high stability ensure smooth display operation and long panel lifetime.
3) Optical Thin Films: The “Regulator” of Light & Structure
Cr targets are used to produce optical coatings with high reflectivity or high absorption, enabling precise control of light transmission and reflection in lenses, filters, sensors, and optical modules.
Due to its strong absorption and excellent patternability, Cr is also widely used as a light-shielding layer in imaging and sensing systems.
4) Decorative Coatings: Functionality Meets Aesthetics
In automotive parts and jewelry, Cr films provide a bright silver metallic finish with excellent wear resistance and anti-fingerprint properties.
Automotive Components: 0.1–0.3 μm Cr layers create a uniform bright base for mirror-like finishes.
Bathroom Hardware: Multi-layer Cr/CrN coatings on faucets and shower heads offer corrosion resistance, wear resistance, and premium appearance.
5) Solar Photovoltaics: Enhancing Energy Conversion
In thin-film solar cell production, Cr targets are used to form back electrodes and buffer layers. Cr coatings increase light absorption and reduce surface reflectance, improving conversion efficiency and lowering energy costs.
Chromium’s corrosion resistance also extends the service life of solar panels, enhancing the overall cost-performance ratio of photovoltaic systems.
III. Our Chromium Targets
To meet the high-end demands of different industries, we have established a comprehensive quality-control system based on years of target R&D and production experience. Every batch of Cr targets offers:
• Custom Production for Diverse Needs
Available in various sizes (diameter 50–1200 mm, thickness 5–50 mm), shapes (planar, rotary, tubular, custom), and purities (2N5, 3N, 3N5).
We also offer bonding (Cu backing plate), polishing, and other machining services to ensure full compatibility with customers’ equipment and processes.
• Precision Processing with Controlled Microstructure
Using vacuum sintering combined with hot isostatic pressing (HIP), we eliminate internal pores and impurities.
Targets achieve >98% density with grain-uniformity deviation <5%, significantly reducing particle generation and coating defects.
• Full-Process Quality Inspection
From raw materials to finished products, ICP-MS, metallographic microscopy, and ultrasonic testing ensure purity, density, and dimensional accuracy meet 100% of specifications.
• Professional Technical Support
Our technical team provides material selection guidance, film-performance evaluation, and process optimization to help customers reduce cost and improve production efficiency.
IV. Usage Recommendations: Maximizing Value Through Careful Management
To extend the service life of chromium targets:
— Regularly clean target surfaces to remove contaminants and oxides.
— Store targets in dry, dust-free environments when not in use.
— Avoid prolonged sputtering at excessively high power to reduce wear.
Copper Backing Plate Bonding
Purpose: Enhances heat dissipation, prolonging target life.
Selection Tips: Ensure compatibility and good thermal conductivity.
Installation Advice: Maintain optimal contact to maximize heat transfer.
Cleaning & Maintenance Tools
Use soft brushes and non-corrosive cleaning agents.
Store tools properly to prevent contamination and damage.
V. Why Choose Us?- Growing Together With High-End Manufacturing
Our chromium sputtering targets focus on three priorities: stability, durability, and usability.
Whether you need better film uniformity, higher coating quality, or longer target lifetime, we provide high-purity, fine-grain, low-particle targets that make process control easier and mass production more reliable.
We also offer tailored process advice, structure-optimization ideas, and target-consumption assessments to help you get the most from your materials. Choosing us means choosing a stable, reliable, and long-term solution that keeps your production line running smoothly and your products performing better.
Chromium Alloy Target Series
In addition to pure Cr targets, we also supply chromium-aluminum, nickel-chromium, cobalt-chromium, copper-chromium, and iron-chromium-aluminum alloy sputtering targets.