{"id":999936,"date":"2024-06-17T14:14:20","date_gmt":"2024-06-17T06:14:20","guid":{"rendered":"https:\/\/vimaterial.de\/product\/silicon-dioxide-3\/"},"modified":"2026-09-11T15:12:35","modified_gmt":"2026-09-11T07:12:35","slug":"silicon-dioxide-sputtering-target","status":"publish","type":"product","link":"https:\/\/vimaterial.de\/en\/product\/silicon-dioxide-sputtering-target\/","title":{"rendered":"Silicon Dioxide"},"content":{"rendered":"<p><span style=\"color: #0000ff;\"><a style=\"color: #0000ff;\" href=\"https:\/\/vimaterial.de\/search\/?type=name&amp;keyword=sio2\">Silicon dioxide<\/a><\/span> sputtering targets are high-purity ceramic materials widely used to deposit insulating, protective, optical, and dielectric thin films. They are suitable for semiconductor, display, optical coating, photovoltaic, and electronic applications, particularly where high purity, optical transparency, chemical stability, and reliable film uniformity are required.<\/p>\n<p>VIMATERIAL supplies SiO\u2082 sputtering targets in discs, flat plates, pillars, step targets, and other customized geometries. Target dimensions, purity, and configuration can be customized according to your equipment and application requirements.<\/p>\n<p><span style=\"color: #0000ff;\"><strong><a style=\"color: #0000ff;\" href=\"https:\/\/vimaterial.de\/en\/contact-us\/\">Contact us<\/a><\/strong><\/span> for specifications and customized solutions.<\/p>\n<h2><span style=\"font-size: 14pt;\">Key Features<\/span><\/h2>\n<ul>\n<li>High purity<\/li>\n<li>Excellent optical transparency<\/li>\n<li>High chemical stability<\/li>\n<li>Good electrical insulation<\/li>\n<li>Customizable dimensions<\/li>\n<\/ul>\n<h2><span style=\"font-size: 14pt;\">Purity Options<\/span><\/h2>\n<p>The purity of a SiO\u2082 sputtering target directly affects impurity levels, deposition performance, and suitability for different applications. VIMATERIAL can provide different purity grades according to customer requirements.<\/p>\n<table style=\"border-collapse: collapse; width: 75.6116%; height: 96px;\">\n<tbody>\n<tr style=\"height: 24px;\">\n<td style=\"width: 18.3805%; height: 24px;\"><strong>Purity<\/strong><\/td>\n<td style=\"width: 57.2311%; height: 24px;\"><strong>Typical Applications<\/strong><\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 18.3805%; height: 24px;\">99.9%<\/td>\n<td style=\"width: 57.2311%; height: 24px;\">General coating, optical, electronic, and research applications<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 18.3805%; height: 24px;\">99.99%<\/td>\n<td style=\"width: 57.2311%; height: 24px;\">Semiconductor, optical coating, display, and advanced thin-film applications<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 18.3805%; height: 24px;\">99.995%<\/td>\n<td style=\"width: 57.2311%; height: 24px;\">High-precision semiconductor, optoelectronic, and other demanding applications<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<p>Higher-purity grades require tighter control of raw materials, processing conditions, and contamination throughout the manufacturing process.<\/p>\n<h2><span style=\"font-size: 14pt;\">Manufacturing process<\/span><\/h2>\n<p>Silicon dioxide sputtering targets can be manufactured using different ceramic processing and densification technologies, depending on the required purity, density, dimensions, and application.<\/p>\n<ul>\n<li><strong>Powder Metallurgy:<\/strong> A commonly used route for producing conventional SiO\u2082 ceramic targets with controlled composition and dimensions.<\/li>\n<li><strong>Hot Press Sintering:<\/strong> Applies heat and pressure simultaneously to improve material density, mechanical strength, and structural uniformity.<\/li>\n<li><strong>Hot Isostatic Pressing (HIP):<\/strong> Uses high temperature and isostatic gas pressure to further reduce porosity and improve density and homogeneity for demanding applications.<\/li>\n<\/ul>\n<p>The selected manufacturing process has a direct influence on target density, porosity, microstructure, sputtering stability, and film quality.<\/p>\n<h2><span style=\"font-size: 14pt;\">Application of Silicon Dioxide Sputtering Targets<\/span><\/h2>\n<ul>\n<li><strong>Semiconductor &amp; Electronic Materials: <\/strong>SiO\u2082 targets are used to deposit insulating and dielectric films in semiconductor and electronic applications. High-purity targets help minimize contamination and support reliable thin-film performance.<\/li>\n<li><strong>Optical Coatings: <\/strong>Due to its high optical transparency and chemical stability, SiO\u2082 is widely used for anti-reflective coatings, protective coatings, and optical thin films on lenses, optical components, and other substrates.<\/li>\n<li><strong>Display &amp; Thin-Film Applications: <\/strong>SiO\u2082 sputtering targets can be used in PVD processes to produce insulating, protective, and functional thin films for display and electronic devices.<\/li>\n<li><strong>Photovoltaic Applications: <\/strong>SiO\u2082 thin films can be used as protective and optical layers in photovoltaic technologies, including anti-reflective and surface-protection applications.<\/li>\n<li><strong>Other Applications: <\/strong>SiO\u2082 coatings are also used where thermal stability, corrosion resistance, electrical insulation, and surface protection are required.<\/li>\n<\/ul>\n<h2><span style=\"font-size: 14pt;\">Available Shapes &amp; Customization<\/span><\/h2>\n<p>VIMATERIAL can supply SiO\u2082 sputtering targets in various configurations, including:<\/p>\n<ul>\n<li>Disc \/ circular targets<\/li>\n<li>Flat plate targets<\/li>\n<li>Pillar \/ cylindrical targets<\/li>\n<li>Step targets<\/li>\n<li>Custom-shaped targets<\/li>\n<\/ul>\n<p>Purity, dimensions, thickness, shape, and packaging can be customized according to customer drawings or technical specifications.<\/p>\n<h2><span style=\"font-size: 14pt;\">Packaging &amp; Storage<\/span><\/h2>\n<p>SiO\u2082 sputtering targets are vacuum-packed internally and protected with outer carton or wooden case packaging to minimize contamination and physical damage during transportation.<\/p>\n<p>Store in a clean, dry environment and keep the package sealed until use to prevent contamination and moisture exposure.<\/p>\n<h2><span style=\"font-size: 14pt;\">FAQs<\/span><\/h2>\n<h3><span style=\"font-size: 12pt;\">Q1. What purity of SiO\u2082 sputtering target should I choose?<\/span><\/h3>\n<p>A: The appropriate purity depends on your deposition process and application. 99.9% is suitable for general applications, while 99.99% and 99.995% are recommended for applications with stricter impurity-control requirements.<\/p>\n<h3><span style=\"font-size: 12pt;\">Q2. Can SiO\u2082 sputtering targets be customized?<\/span><\/h3>\n<p>A: Yes. VIMATERIAL can customize purity, dimensions, thickness, shape, and target configuration according to customer drawings or equipment specifications.<\/p>\n<h3><span style=\"font-size: 12pt;\">Q3. What shapes of SiO\u2082 targets are available?<\/span><\/h3>\n<p>A: We supply disc, flat plate, pillar, step, and customized SiO\u2082 sputtering targets.<\/p>\n<h3><span style=\"font-size: 12pt;\">Q4. How are SiO\u2082 sputtering targets packaged?<\/span><\/h3>\n<p>A: Targets are vacuum-packed and then protected with carton or wooden case packaging, depending on target size and shipping requirements.<\/p>\n<h3><span style=\"font-size: 12pt;\">Q5. What information should I provide for a customized target?<\/span><\/h3>\n<p>A: For a quotation, please provide the required purity, target shape, dimensions, thickness, quantity, and application or sputtering equipment information where available.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Silicon dioxide sputtering targets are high-purity ceramic materials widely used to deposit insulating, protective, optical, and dielectric thin films. They are suitable for semiconductor, display, optical coating, photovoltaic, and electronic applications, particularly where high purity, optical transparency, chemical stability, and reliable film uniformity are required. VIMATERIAL supplies SiO\u2082 sputtering targets in discs, flat plates, pillars, [&hellip;]<\/p>\n","protected":false},"featured_media":1056333,"comment_status":"open","ping_status":"closed","template":"","meta":{"_acf_changed":false},"product_brand":[264],"product_cat":[86],"product_tag":[327],"class_list":["post-999936","product","type-product","status-publish","has-post-thumbnail","product_brand-vimaterial","product_cat-planer-targets","product_tag-sputtering-targets","first","instock","shipping-taxable","product-type-variable"],"acf":[],"_links":{"self":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product\/999936","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/comments?post=999936"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media\/1056333"}],"wp:attachment":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media?parent=999936"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_brand?post=999936"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_cat?post=999936"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_tag?post=999936"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}