{"id":999724,"date":"2024-06-17T14:11:35","date_gmt":"2024-06-17T06:11:35","guid":{"rendered":"https:\/\/vimaterial.de\/product\/silicon-nitride-3\/"},"modified":"2026-07-20T10:06:51","modified_gmt":"2026-07-20T02:06:51","slug":"silicon-nitride-sputtering-target","status":"publish","type":"product","link":"https:\/\/vimaterial.de\/en\/product\/silicon-nitride-sputtering-target\/","title":{"rendered":"Silicon Nitride"},"content":{"rendered":"

Silicon nitride sputtering target is a high-performance ceramic material with excellent thermal stability, high hardness, superior mechanical strength, high thermal conductivity, and a low coefficient of thermal expansion. These properties make it an ideal material for thin-film deposition in semiconductor, optical coating, aerospace, energy, and advanced industrial applications.<\/p>\n

In addition to sputtering targets, VIMATERIAL also supplies high-purity silicon nitride powders<\/a><\/span> and granules for research and industrial applications.<\/p>\n

Standard purity is 99.5%, with round targets available in diameters from 1 to 8 inches and standard thicknesses of 0.125 inch and 0.25 inch.<\/p>\n

Custom dimensions, purity levels, bonding options, and backing plates are available upon request.<\/em><\/span><\/p>\n

Features<\/span><\/h2>\n
    \n
  • High purity (99.5%)<\/li>\n
  • High density<\/li>\n
  • Excellent sputtering stability<\/li>\n
  • Uniform microstructure<\/li>\n
  • Low particle generation<\/li>\n
  • Suitable for RF magnetron sputtering<\/li>\n
  • Custom dimensions available<\/li>\n<\/ul>\n

    Compatible Processes<\/span><\/h2>\n
      \n
    • Suitable for<\/li>\n
    • RF Magnetron Sputtering<\/li>\n
    • Reactive Sputtering<\/li>\n
    • Thin Film Deposition<\/li>\n
    • Research Laboratories<\/li>\n<\/ul>\n

      Applications of Silicon Nitride Sputtering Targets<\/span><\/h2>\n
        \n
      • Semiconductor Industry: Deposition of silicon nitride insulating and passivation films.<\/li>\n
      • Optical Coatings: Protective coatings with excellent hardness and chemical stability.<\/li>\n
      • Display Technology: TFT-LCD and OLED thin-film deposition.<\/li>\n
      • Solar Cells: Surface passivation and anti-reflection coatings.<\/li>\n
      • MEMS Devices: Protective dielectric films for microelectromechanical systems.<\/li>\n
      • Research & Development: Thin-film deposition for advanced materials research.<\/li>\n<\/ul>\n

        Package<\/span><\/h2>\n

        Vacuum-sealed inner packaging with reinforced wooden outer crates to ensure safe transportation.<\/p>\n

        FAQs<\/span><\/h2>\n

        Q1. Can you manufacture bonded silicon nitride targets?<\/strong><\/p>\n

        Yes. Bonded silicon nitride sputtering targets can be supplied upon request to improve heat dissipation and mechanical stability during sputtering. Different backing plate materials and bonding methods are available depending on your equipment requirements.<\/p>\n

        Q2. Are custom dimensions available?<\/strong><\/p>\n

        Yes. We offer customized diameters, thicknesses, purity levels, and machining tolerances to meet specific sputtering system requirements. Please contact us with your technical specifications for a tailored solution.<\/p>\n

        Q3. Is RF sputtering recommended for silicon nitride targets?<\/strong><\/p>\n

        Yes. Silicon nitride is an electrical insulator, so RF magnetron sputtering is generally recommended for stable plasma generation and high-quality thin film deposition.<\/p>\n

        Q4. What industries use silicon nitride thin films?<\/strong><\/p>\n

        Silicon nitride thin films are widely used in semiconductor devices, optical coatings, solar cells, MEMS, display technologies, and other advanced electronic applications due to their excellent dielectric, mechanical, and chemical properties.<\/p>\n","protected":false},"excerpt":{"rendered":"

        Silicon nitride sputtering target is a high-performance ceramic material with excellent thermal stability, high hardness, superior mechanical strength, high thermal conductivity, and a low coefficient of thermal expansion. These properties make it an ideal material for thin-film deposition in semiconductor, optical coating, aerospace, energy, and advanced industrial applications. In addition to sputtering targets, VIMATERIAL also […]<\/p>\n","protected":false},"featured_media":999725,"comment_status":"open","ping_status":"closed","template":"","meta":{"_acf_changed":false},"product_brand":[264],"product_cat":[86],"product_tag":[327],"class_list":["post-999724","product","type-product","status-publish","has-post-thumbnail","product_brand-vimaterial","product_cat-planer-targets","product_tag-sputtering-targets","first","instock","shipping-taxable","purchasable","product-type-variable"],"acf":[],"_links":{"self":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product\/999724","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/comments?post=999724"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media\/999725"}],"wp:attachment":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media?parent=999724"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_brand?post=999724"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_cat?post=999724"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_tag?post=999724"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}