Ruthenium sputtering targets are a key material for thin film deposition processes such as physical vapour deposition (PVD) and chemical vapour deposition (CVD).<\/p>\n
VIMATERIAL<\/a><\/strong><\/span> offers high-purity ruthenium targets, ruthenium particles, and ruthenium powder. Custom sizes and particle sizes are available upon request. Contact us<\/a><\/strong><\/span> for more information.<\/p>\n Appearance: Silvery-grey to off-white.<\/p>\n Melting Point: 2310\u00b0C, excellent thermal stability.<\/p>\n Density: 12,45 g\/m\u00b3, ensures dense and uniform films.<\/p>\n Electrical Conductivity: High conductivity for stable sputtering performance.<\/p>\n Thermal Expansion: Low coefficient, ensures dimensional stability.<\/p>\n Semiconductor Industry: Ruthenium sputtering targets are used to form conductive and barrier thin films in semiconductor devices, enabling higher integration, improved performance, and enhanced device reliability.<\/p>\n Optical Applications: Applied in optical coatings such as anti-reflective and reflective films, ruthenium thin films offer excellent optical stability and durability, improving device efficiency and service life.<\/p>\n Chemical Industry: Used in catalyst systems or catalyst preparation, ruthenium provides outstanding catalytic activity, enhancing reaction rate, selectivity, and energy efficiency under milder conditions.<\/p>\n Data Storage: Employed in thin-film layers for data storage devices such as hard disk drives, contributing to higher storage density and faster read\/write performance.<\/p>\n The product is packed in sealed, contamination-free containers with protective cushioning materials to prevent mechanical damage, ensuring material purity and integrity during transportation and handling.<\/p>\n Store in a tightly sealed package in a cool, dry, and well-ventilated environment, away from moisture, heat sources, and corrosive substances to maintain product stability and quality.<\/p>\n Q1: What is a ruthenium sputtering target?<\/strong><\/p>\n A: A ruthenium sputtering target is a high-purity metal material used in thin-film deposition processes. It serves as the source material in physical vapor deposition (PVD) systems to create uniform ruthenium-based coatings on various substrates.<\/p>\n Q2: What is a ruthenium sputtering target used for?<\/strong><\/p>\n A: Ruthenium sputtering targets are widely used in semiconductor manufacturing, optical coatings, data storage devices, and advanced electronic components to produce conductive, barrier, and functional thin films with high stability and performance.<\/p>\nProperties<\/span><\/h2>\n
Applications of Ruthenium Sputtering Targets<\/span><\/h2>\n
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