Selenium metal sputtering target is a sputtering target made of high purity selenium metal with specific physicochemical properties for thin film deposition in a variety of applications.<\/p>\n
Properties<\/p>\n
Chemical symbol: Se<\/p>\n
Atomic number: 34<\/p>\n
Atomic weight: 78.96.<\/p>\n
Appearance: grayish, metallic luster, non-metallic texture.<\/p>\n
Density: 4.79g\/cm\u00b3 at 293K.<\/p>\n
Melting point: 217\u00b0C.<\/p>\n
Boiling point: 684.9\u2103.<\/p>\n
Crystal structure: hexagonal crystal system.<\/p>\n
Chemical Properties: Selenium is relatively stable chemically, but can react with many substances under certain conditions. When heated in air, selenium will react with oxygen to produce compounds such as selenium dioxide. It can also react with some metals to form selenides.<\/p>\n
APPLICATIONS<\/p>\n
Electronic industry: in semiconductor manufacturing, can be used to prepare cadmium selenide, zinc selenide and other compounds semiconductor film, these films have excellent photoelectric properties, can be used for the manufacture of photovoltaic devices, solar cells and so on.<\/p>\n
Optical field: it can be used to prepare optical films, such as infrared absorption films, optical filters, etc. By controlling the sputtering process parameters, the thickness and optical properties of the film can be adjusted to meet the needs of different optical applications.<\/p>\n
Display technology: In liquid crystal display, organic light-emitting diode display and other display technologies, selenium metal sputtering targets can be used to prepare transparent conductive films, electrodes and other components to improve the performance and stability of the display.<\/p>\n","protected":false},"excerpt":{"rendered":"
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