Boron Oxide-doped Zinc Oxide sputtering target is a Boron Oxide-doped Zinc Oxide ceramic sputtering target, which can be used to prepare thin films with excellent electrical and optical properties by magnetron sputtering, and is widely used in semiconductors, flat panel displays, solar cells and other fields.<\/p>\n
Boron Oxide-doped Zinc Oxide sputtering targets produced by VIMATERIAL have high purity, and the ratio and size can be customized according to customer’s requirements, our company is good at target binding, and we can bind according to your requirements, please feel free to contact us<\/a><\/span> if you need.<\/p>\n Molecular formula: ZnO:B2O3<\/p>\n Appearance: usually white or off-white target material<\/p>\n Density: generally around 5.6 – 6.0 g\/cm\u00b3.<\/p>\n Semiconductor industry: Boron Oxide-doped Zinc Oxide sputtering targets are used in semiconductor chip manufacturing for wafer fabrication and package testing to form high-quality thin films to ensure chip performance and stability.<\/p>\n Flat panel display field: The sputtering target can enhance the uniformity of large-area film layers in flat panel displays, improve the display quality, reduce production costs, and promote the development of flat panel display technology.<\/p>\n Solar cell field: applied to the preparation of thin-film solar cells, can reduce the amount of materials, reduce manufacturing costs, improve photoelectric conversion performance, for large-scale low-cost photovoltaic power plant construction support.<\/p>\nPhysical Properties<\/span><\/h2>\n
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