Cobalt Silicon Boron sputtering targets are metallic alloys of cobalt, silicon and boron with good thermal stability, hardness and electrical properties. They are mainly used in the sputtering coating process to deposit high-performance thin films on substrates for electronics and semiconductors.<\/p>\n
VIMATERIAL offers Cobalt Silicon Boron sputtering targets . Our Cobalt Silicon Boron sputtering targets are characterised by excellent compositional homogeneity, ultra-high purity and excellent sputtering stability, and we can also provide target binding services. We have a professional R&D team and can accept customisation and experiments, please contact us.<\/a><\/span><\/p>\n Molecular formula: CoSiB<\/p>\n Molecular weight: about 97.83<\/p>\n Appearance: Silver-grey or off-white, metallic luster solid.<\/p>\n Density: about 6 – 7g\/cm\u00b3<\/p>\n Melting point: about 1200 – 1400\u00b0C<\/p>\n Electronic field: used in the manufacture of electronic components, can form a good conductivity and stability of the film, enhance the performance and reliability of the components.<\/p>\n Semiconductor field: In the production of semiconductor chips, the target can deposit special thin films to optimise the electrical characteristics and thermal stability of the chip, and help to improve the function of the chip.<\/p>\n Magnetic material field: it can be used to prepare magnetic film, and its unique magnetic properties can provide strong support for the development of magnetic memory devices.<\/p>\n Sensors: Used in the production of sensors, the deposition of thin films gives sensors excellent sensitivity characteristics and environmental adaptability, improving the accuracy and stability of sensors.<\/p>\nPhysical properties<\/span><\/h2>\n
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