Iron Silicon Boron sputtering target is a kind of alloy target composed of iron, silicon and boron, which is used in the process of physical vapour deposition, when sputtering, it can make the iron, silicon and boron atoms deposit on the substrate to form a thin film with high permeability, low coercivity, good soft magnetic properties and thermal stability, which has been widely used in the fields of magnetic materials, electronic components and so on.<\/p>\n
VIMATERIAL provides Iron Silicon Boron sputtering targets , our Iron Silicon Boron sputtering targets have the advantages of high purity, good density, good crystal structure, excellent thin film properties, high dimensional accuracy, high sputtering efficiency and we can provide binding service, we can accept the customisation of the products and experiments. Please contact us<\/a><\/span> for more information.<\/p>\n Molecular Formula: FeSiB<\/p>\n Appearance: Silver grey metallic luster, smooth surface target material.<\/p>\n Density: about 7 – 8 g\/cm\u00b3.<\/p>\n Melting point: roughly in the range of 1200 – 1400\u00b0C<\/p>\n Electronic field: used in the manufacture of transformer cores, inductors and other electronic components, to improve the efficiency of electromagnetic conversion.<\/p>\n Power field: used in power transformers to reduce core loss and improve power transmission efficiency.<\/p>\n Communication field: as a magnetic component in communication equipment, to ensure the stability and quality of signal transmission.<\/p>\nPhysical Properties<\/span><\/h2>\n
Applications<\/span><\/h2>\n
Quality control<\/span><\/h2>\n