{"id":1002006,"date":"2024-06-17T14:43:25","date_gmt":"2024-06-17T06:43:25","guid":{"rendered":"https:\/\/vimaterial.de\/product\/iron-silicide-2\/"},"modified":"2025-04-16T14:20:06","modified_gmt":"2025-04-16T06:20:06","slug":"iron-silicide-2","status":"publish","type":"product","link":"https:\/\/vimaterial.de\/en\/product\/iron-silicide-2\/","title":{"rendered":"Iron Silicide"},"content":{"rendered":"<p><span style=\"color: #0000ff;\"><a style=\"color: #0000ff;\" href=\"https:\/\/vimaterial.de\/en\/product\/iron-silicide\/\">Iron Silicide<\/a> <\/span>sputtering target is a compound target mainly composed of iron and silicon, which is used for physical vapour deposition. During the sputtering process, iron and silicon atoms are deposited on the substrate to form thin films with high melting point, good chemical stability and specific electrical properties, which are important in the fields of semiconductors and electronic devices.<\/p>\n<p>VIMATERIAL provides Iron Silicide sputtering targets, our Iron Silicide sputtering targets have the advantages of high purity, good density, good crystal structure, excellent thin film properties, high dimensional accuracy and high sputtering efficiency and we can provide binding service, we can accept customisation and experiments of the product, please Please <span style=\"color: #0000ff;\"><a style=\"color: #0000ff;\" href=\"https:\/\/vimaterial.de\/en\/contact-us\/\">contact us.<\/a><\/span><\/p>\n<h2><span style=\"font-size: 14pt;\">Physical Properties<\/span><\/h2>\n<p>Molecular Formula: FeSi\u2082<\/p>\n<p>Molecular weight: 119.975<\/p>\n<p>Appearance: grey powder or silver target<\/p>\n<p>Density: about 4.79g\/cm\u00b3<\/p>\n<p>Melting point: about 1410\u00b0C<\/p>\n<p>Crystal structure: Tetragonal crystal system<\/p>\n<h2><span style=\"font-size: 14pt;\">Applications<\/span><\/h2>\n<p>Semiconductor field: Used as contact electrodes in the manufacture of silicon-based transistors in integrated circuits to enhance the electrical performance and stability of devices.<\/p>\n<p>Photovoltaic field: used as contact layer material for silicon-based solar cells to reduce resistance and improve cell conversion efficiency.<\/p>\n<p>Electronic device field: used in the ohmic contact layer of electronic components to ensure the high efficiency and reliability of electronic transmission.<\/p>\n<h2><span style=\"font-size: 14pt;\">Quality control<\/span><\/h2>\n<p><span style=\"color: #0000ff;\"><a style=\"color: #0000ff;\" href=\"https:\/\/vimaterial.de\/en\/quality-control\/\">The quality control<\/a><\/span> of our products is very strict, from the selection of high-purity and stable raw materials, to the use of advanced precision equipment and rigorous technology throughout the precise control of the production process, to the use of professional testing methods on the product&#8217;s physical, chemical, microstructure and other properties of the full range of in-depth testing, each link is strictly follow the international high standards, to ensure that each batch of materials delivered with excellent quality and stability, to provide customers with a solid and reliable quality assurance. We are committed to ensuring that each batch of materials delivered has excellent quality and stability, providing customers with a solid and reliable quality assurance.<\/p>\n<h2><span style=\"font-size: 14pt;\">Packaging and storage<\/span><\/h2>\n<p>Iron Silicide sputtering targets are packed in double-layer vacuum bags and boxes, and the outside is packed in cardboard boxes.<\/p>\n<p>Iron Silicide sputtering targets should be stored in a dry, cool and well-ventilated environment, avoiding moisture and contact with corrosive chemicals, as well as preventing the targets from being subjected to violent impacts and rapid changes in temperature.<\/p>\n","protected":false},"excerpt":{"rendered":"<p><span style=\"color: #0000ff;\"><a style=\"color: #0000ff;\" href=\"https:\/\/vimaterial.de\/en\/product\/iron-silicide\/\">Iron Silicide<\/a> <\/span>sputtering target is a compound target mainly composed of iron and silicon, which is used for physical vapour deposition. During the sputtering process, iron and silicon atoms are deposited on the substrate to form thin films with high melting point, good chemical stability and specific electrical properties, which are important in the fields of semiconductors and electronic devices.<\/p>\n","protected":false},"featured_media":1040842,"comment_status":"open","ping_status":"closed","template":"","meta":{"_acf_changed":false},"product_brand":[],"product_cat":[86],"product_tag":[],"class_list":{"0":"post-1002006","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-planer-targets","8":"first","9":"instock","10":"shipping-taxable","11":"product-type-variable"},"acf":[],"_links":{"self":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product\/1002006","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/comments?post=1002006"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media\/1040842"}],"wp:attachment":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media?parent=1002006"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_brand?post=1002006"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_cat?post=1002006"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_tag?post=1002006"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}