Iron sulfide sputtering target is a compound target consisting of iron and sulfur, used in the physical vapour deposition process, in which iron and sulfur atoms are deposited on the substrate during sputtering to form thin films with a certain chemical stability and special photovoltaic properties, which are used in the fields of photovoltaic materials, mineral research and so on.<\/p>\n
VIMATERIAL provides Iron sulfide sputtering targets, our Iron sulfide sputtering targets have the advantages of high purity, good density, good crystal structure, excellent thin film properties, high dimensional accuracy and high sputtering efficiency and we can provide the binding service, we can accept the customisation of the products and experiments, please contact us<\/a><\/span> soon.<\/p>\n Molecular Formula: FeS<\/p>\n Molecular weight: about 87.91 g\/mol<\/p>\n Appearance: Usually black-brown or copper-yellow target with metallic luster.<\/p>\n Density: about 4.84 g\/cm\u00b3.<\/p>\n Melting point: about 1194\u2103<\/p>\n Boiling point: about 1600\u2103 for sublimation temperature<\/p>\n Crystal structure: Hexagonal crystal system<\/p>\n Battery field: used in the preparation of new battery electrode materials to improve the energy storage and conversion performance of the battery.<\/p>\n Optoelectronic device field: used as active layer material to boost the absorption of light and charge transmission in optoelectronic devices.<\/p>\n Catalytic field: used as catalyst or catalyst carrier to accelerate the process of chemical reaction and improve the reaction efficiency.<\/p>\nPhysical Properties<\/span><\/h2>\n
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