{"id":1001472,"date":"2024-06-17T14:36:23","date_gmt":"2024-06-17T06:36:23","guid":{"rendered":"https:\/\/vimaterial.de\/product\/chromium-silicide-3\/"},"modified":"2025-04-17T13:52:21","modified_gmt":"2025-04-17T05:52:21","slug":"chromium-silicide-sputtering-target","status":"publish","type":"product","link":"https:\/\/vimaterial.de\/en\/product\/chromium-silicide-sputtering-target\/","title":{"rendered":"Chromium Silicide"},"content":{"rendered":"

Chromium Silicide<\/a> <\/span>sputtering target is a sputtering target composed of chromium and silicon, which is widely used for thin film deposition in semiconductor, optics, magnetic storage, solar energy and other fields.<\/p>\n

VIMATERIAL provides Chromium Silicide sputtering target, our Chromium Silicide sputtering target has the features of high purity, high density, fine and uniform grain size, etc. We can provide target binding service. We have a professional technology research and development team, accept any product customisation and experiment, if you need please contact us<\/a><\/span>.<\/p>\n

Physical Properties<\/span><\/h2>\n

Molecular Formula: CrSi\u2082<\/p>\n

Molecular weight: 108.17<\/p>\n

Appearance: generally grey-black target material<\/p>\n

Density: about 6.3 g\/cm3<\/p>\n

Melting point: about 1490\u00b0C<\/p>\n

Crystal structure: cubic crystal.<\/p>\n

Applications<\/span><\/h2>\n

Semiconductor field: Chromium Silicide sputtering target is used to manufacture contact layers and interconnection structures in semiconductor chips, and its stable electrical properties ensure precise signal transmission and improve the performance of integrated circuits.<\/p>\n

Photovoltaic industry: In the preparation of solar cells, the sputtering target can form high-efficiency silicon-based composite films, enhance the photoelectric conversion efficiency, and help the efficient use of clean energy.<\/p>\n

High-temperature coating field: it can provide high-temperature and oxidation-resistant coatings for aerospace engine components, industrial furnace linings, etc., and effectively extend the service life of the components through sputtering process deposition.<\/p>\n

Electronic device encapsulation: used in the coating of electronic component encapsulation shell, to enhance its heat dissipation performance and mechanical strength, to ensure the stable operation of electronic devices in complex working conditions.<\/p>\n

Magnetic recording technology: In magnetic storage devices such as hard discs, it helps to construct thin film layers with special magnetic properties, optimise the reading and writing of magnetic heads, and achieve reliable storage of big data.<\/p>\n

Quality Control<\/span><\/h2>\n

VI HALBLEITERMATERIAL GmbH<\/a><\/span> is committed to high quality control and batch consistency in support of the overall objectives of REACH through the adoption of a rigorous quality assurance system, strict quality control at all stages of the production chain, adherence to the principle of reworking and redoing of defective products, testing and releasing batches in accordance with detailed specifications, adherence to the highest standards in all areas, handling of problems in accordance with the 8D process, compliance with REACH and compliance with related standards.<\/p>\n

We are committed to achieving high quality control and batch consistency in support of the overall objectives of REACH, as well as maintaining documentation and batch traceability to create a socially responsible supply chain that ensures the delivery of high quality products and services.<\/p>\n

Packaging and Storage<\/span><\/h2>\n

Chromium Silicide sputtering target is packed in double vacuum bagged back boxes and outer carton boxes.<\/p>\n

Chromium Silicide sputtering target should be stored in a dry, clean, stable temperature and humidity environment without corrosive gases, to avoid moisture, oxidation, contamination with impurities, while preventing physical collision and extrusion, preferably in sealed packages, placed in a protected special storage rack.<\/p>\n","protected":false},"excerpt":{"rendered":"

Chromium Silicide<\/a> <\/span>sputtering target is a sputtering target composed of chromium and silicon, which is widely used for thin film deposition in semiconductor, optics, magnetic storage, solar energy and other fields.<\/p>\n","protected":false},"featured_media":1030076,"comment_status":"open","ping_status":"closed","template":"","meta":{"_acf_changed":false},"product_brand":[],"product_cat":[86],"product_tag":[],"class_list":{"0":"post-1001472","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-planer-targets","8":"first","9":"instock","10":"shipping-taxable","11":"product-type-variable"},"acf":[],"_links":{"self":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product\/1001472","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/comments?post=1001472"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media\/1030076"}],"wp:attachment":[{"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/media?parent=1001472"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_brand?post=1001472"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_cat?post=1001472"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/vimaterial.de\/en\/wp-json\/wp\/v2\/product_tag?post=1001472"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}