Chromium Nickel Aluminum Alloy sputtering target is a kind of alloy sputtering target composed of chromium, nickel and aluminium, which has the characteristics of high purity, high density, good electrical conductivity and thermal stability, and it has a wide range of applications in the fields of electronics, optics, wear and corrosion resistance, and so on.<\/p>\n
VIMATERIAL provides Chromium Nickel Aluminum Alloy sputtering targets. Our Chromium Nickel Aluminum Alloy sputtering targets are of high purity, high density, high melting point, and can form high-quality and stable thin films, and they also have good abrasion and corrosion resistance, conductivity and thermal stability. We can provide target binding service and we have a professional technology research and development team, accept any product customisation and experiment, if you need please contact us.<\/a><\/span><\/p>\n Molecular formula: NiCrAl<\/p>\n Appearance: Usually silver grey target with metallic luster.<\/p>\n Density: usually around 7.0-8.5 g\/cm\u00b3.<\/p>\n Melting point: usually between 1300\u2103-1500\u2103.<\/p>\n Boiling point: around 2500\u2103-3000\u2103.<\/p>\n Crystal structure: usually face-centred cubic lattice structure<\/p>\n Electronics: Chromium Nickel Aluminum Alloy sputtering target can be used to manufacture conductive layers, resistive films and strain gauge sensitive films for electronic devices, providing stable current transmission and good thermal management performance.<\/p>\n Optical field: capable of preparing thin films with high refractive index and good optical transparency, which can be used in the manufacture of optical lenses, window materials, anti-reflective coatings and low-emission glass, etc., and help to improve light transmittance and imaging quality.<\/p>\n Semiconductor field: in the semiconductor chip wafer manufacturing and chip packaging process, can be used for the production of wafer conductive layer, barrier layer and metal gate, etc., to improve the performance and stability of the chip plays an important role.<\/p>\n Energy field: in solar photovoltaic cells, it can be used to prepare the electrode, reflective layer and barrier layer, etc., which helps to improve the photoelectric conversion efficiency and stability of the battery; in new energy batteries, it can be used to prepare the collector of the battery, protective film, etc., which improves the performance and safety of the battery.<\/p>\n Medical field: Due to its good biocompatibility and corrosion resistance, Chromium Nickel Aluminum Alloy sputtering target can be used in the manufacture of implantable medical devices and medical materials, such as artificial hip joints, artificial respirators, etc., to ensure the safety and reliability of medical devices.<\/p>\nPhysical Properties<\/span><\/h2>\n
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