Catalogries

Chemical Name:
Tantalum metal
Formula:
Ta
Product No.:
7300
CAS No.:
7440-25-7
EINECS No.:
231-135-5
Form:
Sputtering Target
HazMat:
Product ID Formula Purity Dimension Quantity Price in € Inquiry
7300ST001 Ta 99.95% Ø 25.4 mm x 3.175 mm 1 POR Inquire
7300ST002 Ta 99.99% Ø 25.4 mm x 6.35 mm 1 POR Inquire
7300ST003 Ta 99.999% Ø 25.4 mm x 6.35 mm 1 POR Inquire
7300ST004 Ta 99.95% Ø 50.8 mm x 3.175 mm 1 POR Inquire
7300ST005 Ta 99.99% Ø 50.8 mm x 3.175 mm 1 POR Inquire
7300ST006 Ta 99.999% Ø 50.8 mm x 6.35 mm 1 POR Inquire
7300ST007 Ta 99.99% Ø 76.2 mm x 3.175 mm 1 POR Inquire
7300ST008 Ta 99.999% Ø 76.2 mm x 6.35 mm 1 POR Inquire
7300ST009 Ta 99.95% Ø 101.6 mm x 6.35 mm 1 POR Inquire
7300ST010 Ta 99.99% Ø 101.6 mm x 6.35 mm 1 POR Inquire
7300ST011 Ta 99.999% Ø 101.6 mm x 6.35 mm 1 POR Inquire
7300ST012 Ta 99.99% Ø 125.4 mm x 3.175 mm 1 POR Inquire
7300ST013 Ta 99.99% Ø 125.4 mm x 6.35 mm 1 POR Inquire
7300ST014 Ta 99.999% Ø 125.4 mm x 6.35 mm 1 POR Inquire
7300ST015 Ta 99.95% Ø 150 mm x 6 mm 1 POR Inquire
7300ST016 Ta 99.99% Ø 150 mm x 6 mm 1 POR Inquire
7300ST017 Ta 99.99% Ø 223 mm x 6 mm 1 POR Inquire
7300ST018 Ta 99.999% Ø 223 mm x 6 mm 1 POR Inquire
7300ST019 Ta 99.99% 241.3 mm x 203.2 mm x 6.35mm 1 POR Inquire
Product ID
7300ST001
Formula
Ta
Purity
99.95%
Dimension
Ø 25.4 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
7300ST002
Formula
Ta
Purity
99.99%
Dimension
Ø 25.4 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST003
Formula
Ta
Purity
99.999%
Dimension
Ø 25.4 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST004
Formula
Ta
Purity
99.95%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
7300ST005
Formula
Ta
Purity
99.99%
Dimension
Ø 50.8 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
7300ST006
Formula
Ta
Purity
99.999%
Dimension
Ø 50.8 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST007
Formula
Ta
Purity
99.99%
Dimension
Ø 76.2 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
7300ST008
Formula
Ta
Purity
99.999%
Dimension
Ø 76.2 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST009
Formula
Ta
Purity
99.95%
Dimension
Ø 101.6 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST010
Formula
Ta
Purity
99.99%
Dimension
Ø 101.6 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST011
Formula
Ta
Purity
99.999%
Dimension
Ø 101.6 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST012
Formula
Ta
Purity
99.99%
Dimension
Ø 125.4 mm x 3.175 mm
Quantity
1
Price in €
POR
Product ID
7300ST013
Formula
Ta
Purity
99.99%
Dimension
Ø 125.4 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST014
Formula
Ta
Purity
99.999%
Dimension
Ø 125.4 mm x 6.35 mm
Quantity
1
Price in €
POR
Product ID
7300ST015
Formula
Ta
Purity
99.95%
Dimension
Ø 150 mm x 6 mm
Quantity
1
Price in €
POR
Product ID
7300ST016
Formula
Ta
Purity
99.99%
Dimension
Ø 150 mm x 6 mm
Quantity
1
Price in €
POR
Product ID
7300ST017
Formula
Ta
Purity
99.99%
Dimension
Ø 223 mm x 6 mm
Quantity
1
Price in €
POR
Product ID
7300ST018
Formula
Ta
Purity
99.999%
Dimension
Ø 223 mm x 6 mm
Quantity
1
Price in €
POR
Product ID
7300ST019
Formula
Ta
Purity
99.99%
Dimension
241.3 mm x 203.2 mm x 6.35mm
Quantity
1
Price in €
POR

Tantalum sputtering target is a high-performance refractory metal target widely used in semiconductor manufacturing, optical coatings and other thin-film deposition applications. With a high melting point, high density and excellent corrosion resistance, tantalum provides stable performance under demanding sputtering conditions.

VIMATERIAL supplies tantalum sputtering targets in different shapes, dimensions and configurations, with customized specifications available according to your deposition equipment and application requirements. Contact us for more information.

Key Advantages

  • – High melting point of approximately 2996°C for demanding deposition environments
  • – High density, approximately 16.69 g/cm³
  • – Excellent corrosion resistance and chemical stability
  • – Good electrical conductivity, suitable for conductive thin-film applications
  • – Stable sputtering performance for PVD and thin-film deposition
  • – Available in custom dimensions, shapes and configurations
  • – Suitable for semiconductor, optical coating and other advanced coating applications

Basic properties

Property Typical Value
Chemical symbol Ta
Atomic number 73
Atomic weight 180.95 g/mol
Appearance Grey metallic
Melting point Approx. 2996°C
Density Approx. 16.69 g/cm³
Corrosion resistance Excellent
Electrical conductivity Good
Material type Refractory metal

Tantalum Sputtering Target Manufacturing

Tantalum sputtering targets are manufactured from high-purity tantalum raw materials through controlled material processing.
Depending on the required target specification, processes such as powder metallurgy, sintering, rolling, forging, machining and surface finishing may be applied.

The manufacturing process is controlled to achieve the required composition, density, dimensions, surface quality and structural consistency, helping provide stable target performance during sputtering.

For customized tantalum targets, VIMATERIAL can work according to drawings, dimensions and equipment requirements.

Applications of Tantalum Sputtering Target

  • Semiconductor Industry: It is used in semiconductor and microelectronics manufacturing for the deposition of tantalum-containing thin films, including applications related to barrier layers, conductive structures and advanced interconnect technologies.
  • Optical Coating: Tantalum-based thin films can be used in optical coating systems to modify the optical properties of components, including reflectance, transmittance and refractive characteristics. Applications may include optical lenses, camera components and other optical instruments.
  • Thin-Film and PVD Applications: Tantalum targets are also used in various physical vapor deposition (PVD) processes where a refractory metal with good chemical stability and electrical conductivity is required.

Available Specifications of Tantalum Target

VIMATERIAL can supply tantalum sputtering targets in different configurations according to customer requirements.

Specification Options
Material Tantalum (Ta)
Target shape Round, rectangular, planar and customized
Dimensions Customized according to drawing
Purity 99.95%, 99.99%, 99.999% or customized
Surface Machined / finished according to requirements
Manufacturing Sintered, rolled, forged and machined options
Bonding Target bonding service available
Quantity Small-batch orders supported

*Custom dimensions and configurations can be produced according to drawings or technical specifications.

Quality Control

For tantalum sputtering targets, quality control focuses on chemical composition, purity, density, dimensions, surface condition and overall target consistency. These factors are important for achieving stable deposition performance and consistent thin-film quality.

VIMATERIAL can provide technical support for selecting the appropriate tantalum target specification based on your sputtering system, target dimensions and deposition requirements.

Packaging and Storage

Packaging: Tantalum sputtering targets are individually protected and securely packed to prevent contamination, scratches and mechanical damage during transportation.

Storage: Store the targets in a clean, dry environment and keep them sealed or appropriately protected until use to minimize surface contamination and oxidation.

Why Choose VIMATERIAL?

VIMATERIAL supplies tantalum sputtering targets for research, development and industrial thin-film applications. In addition to standard specifications, we support custom target dimensions, shapes and technical requirements.

Our material solutions include:

  • High-purity tantalum materials
  • Custom target sizes and shapes
  • Small-batch orders
  • Target bonding service
  • Technical support
  • Application-specific material selection
  • Flexible packaging and delivery options

FAQs

Q1. What is a tantalum sputtering target used for?

It is mainly used for PVD thin-film deposition in semiconductor manufacturing, optical coatings and other advanced coating applications.

Q2. What shapes of tantalum sputtering targets are available?

Tantalum targets can be supplied in round, rectangular, planar and other customized shapes according to the sputtering equipment and application requirements.

Q3. Can tantalum sputtering targets be customized?

Yes. VIMATERIAL can provide customized sputtering targets according to customer drawings, dimensions, purity requirements and other technical specifications.

Q4. Does VIMATERIAL provide target bonding?

Yes. VIMATERIAL provides a sputtering target bonding service for suitable target configurations and can support bonding requirements according to the customer’s equipment and application.

Need a Custom Tantalum Sputtering Target?

Tell us your target material, purity, dimensions, shape, quantity and sputtering equipment requirements. We can recommend a suitable target configuration and provide a quotation based on your application.

Need a Custom Material Solution? Contact VIMATERIAL for technical support and a tailored solution.

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QUALITY ASSURANCE

VI HALBLEITERMATERIAL GmbH (VIMATERIAL) employs a stringent quality assurance system to ensure the reliability of our product quality. Strict quality control is implemented throughout the entire production chain, and for defective products, we strictly enforce the principle of rework and redo. Each batch is released only after passing detailed specification tests.

Every batch of our materials is independently tested, and, if necessary, we send samples to certified companies for testing. We provide these documents and analysis certificates with the shipment to certify that our products meet the required standards.

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